"Thermal-chemical vapor deposition equipment with 1”, 2”, 3” quartz furnaces. Gas sources Ar, H2, CH4 and O2 are supplied. It’s allowable for for long time process with temp. ≦ 1100℃. Main application is for thin-film deposition of graphene or other materials and it can be used for thermal annealing process . 1”& 2” furnaces are opened for user operation and 3” quartz furnaces is only for graphene OEM."
|Name||3 Inch Chemical Vapor Deposition for Graphene|
Chemical vapor deposition