3 Inch Chemical Vapor Deposition for Graphene

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • Location

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701

    Description

    "Thermal-chemical vapor deposition equipment with 1”, 2”, 3” quartz furnaces. Gas sources Ar, H2, CH4 and O2 are supplied. It’s allowable for for long time process with temp. ≦ 1100℃. Main application is for thin-film deposition of graphene or other materials and it can be used for thermal annealing process .   1”& 2” furnaces are opened for user operation and 3” quartz furnaces is only for graphene OEM."

    Details

    Name3 Inch Chemical Vapor Deposition for Graphene
    Acquisition date15-05-14

    Fingerprint

    Graphene
    Chemical vapor deposition
    Furnaces
    Quartz
    Annealing
    Thin films
    Gases
    Hot Temperature