CO2 Supercritical Dry Release Machine

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • Location

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701

      Taiwan

    Equipments Details

    Description

    The supercritical release system dries wafers or dies after wet processing (such as release) without any surface tension (thus preventing stiction). The supercritical CO2 release system uses liquid CO2 to displace methanol from the system chamber at pressure. The chamber is then heated past the CO2 supercritical point, and the pressure released. The supercritical CO2 has extremely low surface tension, and as a result does not pull structures down as it transitions from liquid to gas. The lowered surface tension makes it easier for the fluid to penetrate complex geometries and small cracks.

    Details

    NameCO2 Supercritical Dry Release Machine
    Acquisition date02-06-04

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