Double-Side Mask Aligner/UV Imprinter

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • Location

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701

      Taiwan

    Description

    Among various kinds of alternative patterning technologies, nano-imprinting lithography can fabricate the nanosized patterns with high throughput and does not require the complicated equipment and process. Hence, it can fabricate the nano-sized patterns on a large substrate with relatively low cost. Recently developed monomer based UV curing imprinting lithography can produce the patterns at much lower pressure and temperature.

    Details

    NameDouble-Side Mask Aligner/UV Imprinter
    Acquisition date04-12-09

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    Lithography
    Masks
    Curing
    Monomers
    Throughput
    Substrates
    Costs
    Temperature