Dual Beam-Focused Ion Beam I, FEI Nova-200

Focused Ion Beam (FIB) systems utilize a finely focused beam of gallium ions operated at low-beam currents for imaging and at high-beam currents for site-specific milling. The generated secondary electrons (or ions) are collected to form an image of the surface of the sample. The ion beam allows the milling of small holes in the sample at well localized sites, so that cross-sectional images of the structure can be obtained or that modifications in the structures can be made.