E-beam Evaporator II

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • Location

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701

      Taiwan

    Description

    E-beam Evaporator can coating diferent thin film layer on silicon wafer, glass substrate and piezoelectric material surface. The main evaporator thin films have metal, nonmetal and oxide, etc. and once can input 4 inch wafer 15 PCS. The uniformity of this thin film on wafer can control in 5 % difference. Depend on that can plate thin film of more than one layer on wafer in demand.Au, Al, Ni, Pt, Ti, Cr, and Ag ( minimum uniform thickness 100 A)

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    evaporators
    wafers
    thin films
    coatings
    oxides
    glass
    silicon
    metals