Equipments Details
Description
"‧ It is capable of drawing lines of 10 nm width.
‧ Laser interferometer reads stage position with 0.6 nm resolution and helps to achieve at 50nm of stitching and overlay accuracy.
‧ The use of 18bit DAC provides electron beam positioning with 0.31 nm resolution.
‧ The system is operated completely from a PC and is easy to use."
‧ Laser interferometer reads stage position with 0.6 nm resolution and helps to achieve at 50nm of stitching and overlay accuracy.
‧ The use of 18bit DAC provides electron beam positioning with 0.31 nm resolution.
‧ The system is operated completely from a PC and is easy to use."
Details
| Name | Electron Beam Lithography System |
|---|---|
| Acquisition date | 11-04-22 |
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