Electron Beam Lithography System

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • Location

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701

      Taiwan

    Description

    "‧ It is capable of drawing lines of 10 nm width.
    ‧ Laser interferometer reads stage position with 0.6 nm resolution and helps to achieve at 50nm of stitching and overlay accuracy.
    ‧ The use of 18bit DAC provides electron beam positioning with 0.31 nm resolution.
    ‧ The system is operated completely from a PC and is easy to use."

    Details

    NameElectron Beam Lithography System
    Acquisition date11-04-22

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    lithography
    electron beams
    positioning
    interferometers
    lasers