Magnetron Sputter Deposition

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • Location

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701

      Taiwan

    Description

    Principal functions: This system is equipped with DC and RF guns capable of sputtering both metallic and metal oxide films. However, it has been decided by the Micro-nano Technology Research Center of NCKU that this system is to be reserved for DC sputtering only and the targets that are metallic in nature such as Al, Ti, Ag and several others are the only allowable sources for depositing metal films. The RF guns will be later removed from this machine and added them to the second RF sputtering system already purchased by the Center.

    Details

    NameMagnetron Sputter Deposition
    Acquisition date01-06-08

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    sputtering
    direct current
    nanotechnology
    metal films
    metal oxides
    oxide films
    oxides