Magnetron Sputter Deposition

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • LocationShow on map

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701


    Equipments Details


    Principal functions: This system is equipped with DC and RF guns capable of sputtering both metallic and metal oxide films. However, it has been decided by the Micro-nano Technology Research Center of NCKU that this system is to be reserved for DC sputtering only and the targets that are metallic in nature such as Al, Ti, Ag and several others are the only allowable sources for depositing metal films. The RF guns will be later removed from this machine and added them to the second RF sputtering system already purchased by the Center.


    NameMagnetron Sputter Deposition
    Acquisition date01-06-08


    Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.