Single-Side Mask Aligner

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • Location

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701

      Taiwan

    Description

    The mask aligner uses UV light as an exposure light source to lithographically transfer mask patterns onto the resist-coated substrate (minimum feature size is 2um).

    Details

    NameSingle-Side Mask Aligner
    Acquisition date06-11-01

    Fingerprint

    masks
    light sources