Single-Side Mask Aligner

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • Location

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701

      Taiwan

    Equipments Details

    Description

    The mask aligner uses UV light as an exposure light source to lithographically transfer mask patterns onto the resist-coated substrate (minimum feature size is 2um).
    Photo associated with equipment

    Details

    NameSingle-Side Mask Aligner
    Acquisition date06-11-01

    Fingerprint

    Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.