Single-Side Mask Aligner

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • LocationShow on map

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701


    Equipments Details


    The mask aligner uses UV light as an exposure light source to lithographically transfer mask patterns onto the resist-coated substrate (minimum feature size is 2um).


    NameSingle-Side Mask Aligner
    Acquisition date06-11-01


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