Single-Side Mask Aligner

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • Location

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701


    Equipments Details


    The mask aligner uses UV light as an exposure light source to lithographically transfer mask patterns onto the resist-coated substrate (minimum feature size is 2um).
    Photo associated with equipment


    NameSingle-Side Mask Aligner
    Acquisition date06-11-01


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