Spin Coater II

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • Location

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701

      Taiwan

    Description

    The photoresist is uniformly applied to the wafer by centrifugal force.

    Details

    NameSpin Coater II
    Acquisition date15-03-24

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    centrifugal force
    photoresists
    wafers