Spin Coater II

    Facility/equipment: EquipmentCenter for Micro/Nano Science and Technology

    • Location

      No.1, University Road, Tainan City 701, Taiwan (R.O.C.) 701

      Taiwan

    Equipments Details

    Description

    The photoresist is uniformly applied to the wafer by centrifugal force.

    Details

    NameSpin Coater II
    Acquisition date15-03-24

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