Wen-Shi Lee

Personal profile

Education

2002 EMBA, Institute of Material Science, National Sun Yat Sen University

Research Interests

Electronic Ceramic
Organic thin film transistors
RF ceramic components for wireless communication
System In Package
The Thin Film Semiconductor Processing
The Thin Film Solar Cell

Experience

1991~1996 R&D (chief) engineer, Taiwan Philips Electronic Building Elements Incorporation
1996~1998 R&D section manager, Taiwan Philips Electronic Building Elements Incorporation
1998~1999 Researcher, Germany Philips Aachen Lab.
1999~2000 ceramic materials R&D manager, Taiwan Philips Kaohsiung Passive Components BU
2000~2003 HF Ceramic Products Development Manager, Phycomp Ltd.
2003 Assistant Professor, Department of Materials Engineering, I-Shou University
2007 ~ present Assistant Professor, Department of Electronic Engineering, National Kaohsiung University of Applied Science

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Ceramic capacitors Engineering & Materials Science

Network Recent external collaboration on country level. Dive into details by clicking on the dots.

300mm變頻微波退火應用閘極全環鰭式場效電晶體之研發(1/2)

Lee, W.

19-01-01 → 19-12-31

Project: Research project

利用微波退火方式降低新一代半導體材料N型鍺S/D阻值之研究

Lee, W.

17-08-01 → 18-07-31

Project: Research project

低歐姆晶片電阻器卑金屬化技術開發

Lee, W.

17-06-01 → 18-05-31

Project: Research project

超低溫燒結正銅電極應用於高效率矽基太陽能電池

Lee, W.

16-01-01 → 16-12-31

Project: Research project

厚膜印刷式負溫度係數熱敏電阻材料開發

Lee, W.

15-11-01 → 16-10-31

Project: Research project

Research Output 2000 2019

1067 Citations
15 h-Index
122 Article
30 Conference contribution
17 Patent
3 Conference article
2 More
- 1 Editorial
- 1 Review article

Characteristic of high frequency Fe-Si-Cr material for motor application by selective laser melting

Jhong, K. J., Chang, T. W., Lee, W. H., Tsai, M. C. & Jiang, I. H., 2019 Mar 1, In : AIP Advances. 9, 3, 035317.

Research output: Contribution to journal › Article

Open Access

electric motors

melting

electromagnetic properties

eddy currents

printing

Effect of annealing conditions on dopants activation and stress conservation in silicon-germanium

Kuo, T. C., Jhong, K. J., Lin, C. W. & Lee, W-S., 2019 Jan 1, In : AIP Advances. 9, 1, 015110.

Research output: Contribution to journal › Article

conservation

germanium

activation

annealing

silicon

Effect of pretreatment on Al₂O₃ substrate by depositing Al₂O₃ film on the properties of Ni–Cr–Si based thin film resistor

Chung, K. C. & Lee, W-S., 2019 May 15, In : Materials Chemistry and Physics. 234, p. 311-317 7 p.

Research output: Contribution to journal › Article

Aluminum Oxide

resistors

pretreatment

Resistors

aluminum oxides

High Dopant Activation of Boron in SiGe with two-step Implantation and Microwave Annealing

Kuo, T. C., Lin, C. Y., Lee, W. H., Lin, G. P., Hu, S. Y., Walther, S., Su, Y. H. & Mehta, S., 2018 Sep, 2018 22nd International Conference on Ion Implantation Technology, IIT 2018 - Proceedings. Haublein, V. & Ryssel, H. (eds.). Institute of Electrical and Electronics Engineers Inc., p. 50-53 4 p. 8807977. (Proceedings of the International Conference on Ion Implantation Technology; vol. 2018-September).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Boron

Ion implantation

implantation

boron

Chemical activation

1 Citation (Scopus)