Projects per year
Personal profile
Education
- 1994 PhD, Theoretical & Applied Mechanics, Northwestern University
Research Interests
- Maskless Lithography
- Micro/Nano-Fabrication
- Solid Mechanics
- Ultrasound Non-Destructive Evaluation
Experience
- 1997/08 ~ 2000/08 Assistant Professor, Department of Mechanical Engineering, National Cheng Kung University
- 2000/08 ~ 2006/07 Associate Professor, Department of Mechanical Engineering, National Cheng Kung University
- 2006/08 ~ present Professor, Department of Mechanical Engineering, National Cheng Kung University
- 2011/08 ~ 2014/07 Chief, Department of Mechanical Engineering, National Cheng Kung University
- Group Leader, Administrative for Micro/Nano Science and Technology, National Cheng Kung University
- Post-Doctoral Fellow, Applied and Engineering Physics, Cornell University
Expertise related to UN Sustainable Development Goals
In 2015, UN member states agreed to 17 global Sustainable Development Goals (SDGs) to end poverty, protect the planet and ensure prosperity for all. This person’s work contributes towards the following SDG(s):
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Collaborations and top research areas from the last five years
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Projects
- 68 Finished
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Fabrication of microlens array using backside exposure and DMD-based grayscale lithography
Hung, C. K., Wu, C. Y. & Lee, Y. C., 2025 Feb 24, In: Optics Express. 33, 4, p. 7723-7739 17 p.Research output: Contribution to journal › Article › peer-review
Open Access2 Citations (Scopus) -
High performance DMD lithography based on oblique Scanning, pulse Lighting, and optical distortion calibration
Lee, W. F., Wu, C. Y. & Lee, Y. C., 2025 May, In: Optics and Laser Technology. 183, 112388.Research output: Contribution to journal › Article › peer-review
5 Citations (Scopus) -
High-precision alignment system for DMD-based maskless lithography in multilayer exposure applications
Miau, T. H., Wu, C. Y. & Lee, Y. C., 2025 Oct, In: Precision Engineering. 96, p. 937-943 7 p.Research output: Contribution to journal › Article › peer-review
1 Citation (Scopus) -
Nanoimprinting and backside ultraviolet lithography for fabricating metal nanostructures with higher aspect ratio
Ding, Y. C. & Lee, Y. C., 2025 Jan 27, In: Nanotechnology. 36, 4, 045302.Research output: Contribution to journal › Article › peer-review
Open Access2 Citations (Scopus) -
Optimization of pattern quality in DMD scanning maskless lithography: A parametric study of the OS3L exposure algorithm
Miau, T. H. & Lee, Y. C., 2025 Jun 1, In: Microelectronic Engineering. 298, 112328.Research output: Contribution to journal › Article › peer-review
5 Citations (Scopus)