具有雙層通道結構之擬晶性高電子移動率電晶體

Wen-Chau Liu (Inventor)

Research output: Patent

Abstract

一種具有雙層通道(Double Channel)結構之擬晶性高電子移動率電晶體(Pseudomorphic High Electron Mobility Transistor;PHEMT),其係利用雙層由例如磷化銦鎵(InGaP)/砷化銦鎵(InGaAs)/砷化鎵(GaAs)所構成之堆疊結構作為電晶體之通道結構。因此,可利用較厚且銦含量較高之砷化銦鎵層作為通道層,以達到提高電晶體之效能的目的。
Original languageChinese (Traditional)
Patent number189414
Publication statusPublished - 1800

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