0.76% absolute efficiency increase for screen-printed multicrystalline silicon solar cells with nanostructures by reactive ion etching

Wen Hua Chen, Franklin Chau Nan Hong

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

In this study, the reactive ion etching in combination with alkaline etching was employed to texture the surface of a 156×156 mm2 multi-crystalline silicon wafers to reduce their solar reflectivity and improve conversion efficiency. Reactive gases comprising chlorine (Cl2), sulfur hexafluoride (SF6) and oxygen (O2), were activated in the radio-frequency (rf) plasma to fabricate pyramids in an reactive ion etching (RIE) system. The multi-crystalline Si substrates were etched in various compositions of gases to form the nanostructures of various shapes. Besides the nanoscale features, the high density of nanostructures formed on the multi-crystalline Si surface was also required to significantly reduce the reflectivity. A low reflectivity surface was successfully fabricated with the average reflectivity significantly reduced down to <2% for the wavelength range of 300-850 nm. The short wavelength spectral response (blue response) improvement is observed in RIE textured solar cells compared to the standard textured cells. The RIE textured surfaces in combination with optimized emitter resistance result in a remarkable enhancement of short circuit current density. Compared with the acidic textured solar cells, the absolute conversion efficiency of the alkaline+RIE textured cells was improved by 0.76% in average.

Original languageEnglish
Pages (from-to)48-54
Number of pages7
JournalSolar Energy Materials and Solar Cells
Volume157
DOIs
Publication statusPublished - 2016 Dec 1

Fingerprint

Silicon solar cells
Reactive ion etching
Nanostructures
Crystalline materials
Conversion efficiency
Solar cells
Gases
Sulfur Hexafluoride
Sulfur hexafluoride
Wavelength
Chlorine
Silicon wafers
Short circuit currents
Etching
Current density
Textures
Oxygen
Plasmas
Substrates
Chemical analysis

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films

Cite this

@article{198dafb146614719bc0a3a2f3fbb0512,
title = "0.76{\%} absolute efficiency increase for screen-printed multicrystalline silicon solar cells with nanostructures by reactive ion etching",
abstract = "In this study, the reactive ion etching in combination with alkaline etching was employed to texture the surface of a 156×156 mm2 multi-crystalline silicon wafers to reduce their solar reflectivity and improve conversion efficiency. Reactive gases comprising chlorine (Cl2), sulfur hexafluoride (SF6) and oxygen (O2), were activated in the radio-frequency (rf) plasma to fabricate pyramids in an reactive ion etching (RIE) system. The multi-crystalline Si substrates were etched in various compositions of gases to form the nanostructures of various shapes. Besides the nanoscale features, the high density of nanostructures formed on the multi-crystalline Si surface was also required to significantly reduce the reflectivity. A low reflectivity surface was successfully fabricated with the average reflectivity significantly reduced down to <2{\%} for the wavelength range of 300-850 nm. The short wavelength spectral response (blue response) improvement is observed in RIE textured solar cells compared to the standard textured cells. The RIE textured surfaces in combination with optimized emitter resistance result in a remarkable enhancement of short circuit current density. Compared with the acidic textured solar cells, the absolute conversion efficiency of the alkaline+RIE textured cells was improved by 0.76{\%} in average.",
author = "Chen, {Wen Hua} and Hong, {Franklin Chau Nan}",
year = "2016",
month = "12",
day = "1",
doi = "10.1016/j.solmat.2016.05.046",
language = "English",
volume = "157",
pages = "48--54",
journal = "Solar Energy Materials and Solar Cells",
issn = "0927-0248",
publisher = "Elsevier",

}

0.76% absolute efficiency increase for screen-printed multicrystalline silicon solar cells with nanostructures by reactive ion etching. / Chen, Wen Hua; Hong, Franklin Chau Nan.

In: Solar Energy Materials and Solar Cells, Vol. 157, 01.12.2016, p. 48-54.

Research output: Contribution to journalArticle

TY - JOUR

T1 - 0.76% absolute efficiency increase for screen-printed multicrystalline silicon solar cells with nanostructures by reactive ion etching

AU - Chen, Wen Hua

AU - Hong, Franklin Chau Nan

PY - 2016/12/1

Y1 - 2016/12/1

N2 - In this study, the reactive ion etching in combination with alkaline etching was employed to texture the surface of a 156×156 mm2 multi-crystalline silicon wafers to reduce their solar reflectivity and improve conversion efficiency. Reactive gases comprising chlorine (Cl2), sulfur hexafluoride (SF6) and oxygen (O2), were activated in the radio-frequency (rf) plasma to fabricate pyramids in an reactive ion etching (RIE) system. The multi-crystalline Si substrates were etched in various compositions of gases to form the nanostructures of various shapes. Besides the nanoscale features, the high density of nanostructures formed on the multi-crystalline Si surface was also required to significantly reduce the reflectivity. A low reflectivity surface was successfully fabricated with the average reflectivity significantly reduced down to <2% for the wavelength range of 300-850 nm. The short wavelength spectral response (blue response) improvement is observed in RIE textured solar cells compared to the standard textured cells. The RIE textured surfaces in combination with optimized emitter resistance result in a remarkable enhancement of short circuit current density. Compared with the acidic textured solar cells, the absolute conversion efficiency of the alkaline+RIE textured cells was improved by 0.76% in average.

AB - In this study, the reactive ion etching in combination with alkaline etching was employed to texture the surface of a 156×156 mm2 multi-crystalline silicon wafers to reduce their solar reflectivity and improve conversion efficiency. Reactive gases comprising chlorine (Cl2), sulfur hexafluoride (SF6) and oxygen (O2), were activated in the radio-frequency (rf) plasma to fabricate pyramids in an reactive ion etching (RIE) system. The multi-crystalline Si substrates were etched in various compositions of gases to form the nanostructures of various shapes. Besides the nanoscale features, the high density of nanostructures formed on the multi-crystalline Si surface was also required to significantly reduce the reflectivity. A low reflectivity surface was successfully fabricated with the average reflectivity significantly reduced down to <2% for the wavelength range of 300-850 nm. The short wavelength spectral response (blue response) improvement is observed in RIE textured solar cells compared to the standard textured cells. The RIE textured surfaces in combination with optimized emitter resistance result in a remarkable enhancement of short circuit current density. Compared with the acidic textured solar cells, the absolute conversion efficiency of the alkaline+RIE textured cells was improved by 0.76% in average.

UR - http://www.scopus.com/inward/record.url?scp=84971333671&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84971333671&partnerID=8YFLogxK

U2 - 10.1016/j.solmat.2016.05.046

DO - 10.1016/j.solmat.2016.05.046

M3 - Article

AN - SCOPUS:84971333671

VL - 157

SP - 48

EP - 54

JO - Solar Energy Materials and Solar Cells

JF - Solar Energy Materials and Solar Cells

SN - 0927-0248

ER -