1 × 3 silicon oxynitride tunable optical waveguide attenuators based on the multimode interference effect

Zhen Liang Liao, Wen-Kuei Chuang

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The silicon oxynitride (SiON) films of various refractive indices achieved through the careful adjustments of oxygen-to-nitrogen contrast ratios were deposited on silicon substrates using the plasma-enhanced chemical vapor deposition (PECVD) method. The refractive indices of SiON films spanning from 1.47 to 1.94 were realized by manipulating the flow rates of pertinent gaseous precursors. The Fourier transform infrared (FTIR) spectra were gathered in order to verify that a significant reduction in the infrared absorption of the N-H bond could in fact be achieved with the thermal annealing process. Afterward, the integrated 1 × 3 SiO2/SiON/SiO2 tunable multimode interference (MMI) optical waveguide attenuators were then designed and simulated using the beam propagation method (BPM), and the optimal structures were then proceeded for device fabrication. The positive thermooptic (TO) effect of SiON was employed to change the self-imaging light pattern as generated by the side-heated MMI region for purposes of optical steering and beam attenuation. The experiment results showed that a 22-dB attenuation could be realized with the heating power of 2.2 W. Finally, when the heating power of ̃1:73W was applied, the rise and fall times of 1 × 3 tunable MMI optical waveguide attenuators were obtained as 455 and 420 ms, respectively.

Original languageEnglish
Article number04C118
JournalJapanese Journal of Applied Physics
Volume48
Issue number4 PART 2
DOIs
Publication statusPublished - 2009 Apr 1

Fingerprint

Waveguide attenuators
attenuators
oxynitrides
Optical waveguides
optical waveguides
interference
Silicon
silicon
Refractive index
attenuation
refractivity
Beam propagation method
Heating
heating
Infrared absorption
Plasma enhanced chemical vapor deposition
infrared absorption
Fourier transforms
infrared spectra
flow velocity

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

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abstract = "The silicon oxynitride (SiON) films of various refractive indices achieved through the careful adjustments of oxygen-to-nitrogen contrast ratios were deposited on silicon substrates using the plasma-enhanced chemical vapor deposition (PECVD) method. The refractive indices of SiON films spanning from 1.47 to 1.94 were realized by manipulating the flow rates of pertinent gaseous precursors. The Fourier transform infrared (FTIR) spectra were gathered in order to verify that a significant reduction in the infrared absorption of the N-H bond could in fact be achieved with the thermal annealing process. Afterward, the integrated 1 × 3 SiO2/SiON/SiO2 tunable multimode interference (MMI) optical waveguide attenuators were then designed and simulated using the beam propagation method (BPM), and the optimal structures were then proceeded for device fabrication. The positive thermooptic (TO) effect of SiON was employed to change the self-imaging light pattern as generated by the side-heated MMI region for purposes of optical steering and beam attenuation. The experiment results showed that a 22-dB attenuation could be realized with the heating power of 2.2 W. Finally, when the heating power of ̃1:73W was applied, the rise and fall times of 1 × 3 tunable MMI optical waveguide attenuators were obtained as 455 and 420 ms, respectively.",
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1 × 3 silicon oxynitride tunable optical waveguide attenuators based on the multimode interference effect. / Liao, Zhen Liang; Chuang, Wen-Kuei.

In: Japanese Journal of Applied Physics, Vol. 48, No. 4 PART 2, 04C118, 01.04.2009.

Research output: Contribution to journalArticle

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