TY - GEN
T1 - 6-T SRAM cell design with gate-all-around silicon nanowire MOSFETs
AU - Liao, Yi Bo
AU - Chiang, Meng Hsueh
AU - Damrongplasit, Nattapol
AU - Liu, Tsu Jae King
AU - Hsu, Wei Chou
PY - 2013
Y1 - 2013
N2 - 6T-SRAM cell design with gate-all-around (GAA) silicon nanowire (NW) MOSFETs is investigated via three-dimensional TCAD simulations and compact analytical modeling. A rectangular NW channel design allows the transistor width to be adjusted with reduced impact on short-channel effects. This in turn provides a means for tuning the cell ratios to optimize the tradeoff between static noise margin and writeability with optimal cell layout area efficiency.
AB - 6T-SRAM cell design with gate-all-around (GAA) silicon nanowire (NW) MOSFETs is investigated via three-dimensional TCAD simulations and compact analytical modeling. A rectangular NW channel design allows the transistor width to be adjusted with reduced impact on short-channel effects. This in turn provides a means for tuning the cell ratios to optimize the tradeoff between static noise margin and writeability with optimal cell layout area efficiency.
UR - http://www.scopus.com/inward/record.url?scp=84881186940&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84881186940&partnerID=8YFLogxK
U2 - 10.1109/VLSI-TSA.2013.6545631
DO - 10.1109/VLSI-TSA.2013.6545631
M3 - Conference contribution
AN - SCOPUS:84881186940
SN - 9781467330817
T3 - 2013 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2013
BT - 2013 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2013
T2 - 2013 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2013
Y2 - 22 April 2013 through 24 April 2013
ER -