A comparative study of GaAs- and InP-based superlattice emitter resonant tunneling bipolar transistors (SE-RTBT's)

Chun Yuan Chen, Wei Chou Wang, Wen Hui Chiou, Chih Kai Wang, Hung Ming Chuang, Shiou Ying Cheng, Wen Chau Liu

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

The InP/InGaAs and InGaP/GaAs superlattice emitter resonant tunneling bipolar transistors (SE-RTBTs) have been fabricated and demonstrated. By the employment of five-period superlattice in the emitter layer, the RT effect in saturation regime is observed at 77 K for InP/InGaAs SE-RTBT. In addition, due to the larger valence band discontinuity δEV at InGaP/GaAs heterojunction, the RT effect is observed both in saturation and forward active regimes at 300 K for InGaP/GaAs SE-RTBT. The confinement effect for minority carriers is enhanced due to the insertion of superlattice. The common emitter current gains up to 170 and 220 are observed for InP/InGaAs and InGaP/GaAs SE-RTBTs, respectively. Lower offset voltages of about 125 mV are observed in the studied devices.

Original languageEnglish
Article number3086
Pages (from-to)1289-1294
Number of pages6
JournalSolid-State Electronics
Volume46
Issue number9
DOIs
Publication statusPublished - 2002 Jan 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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