A comparative study of sputtered TaCx and WCx films as diffusion barriers between Cu and Si

Shui Jinn Wang, Hao Yi Tsai, S. C. Sun

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Fingerprint

Dive into the research topics of 'A comparative study of sputtered TaCx and WCx films as diffusion barriers between Cu and Si'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds