A Line Extraction Method for Automated SEM Inspection of VLSI Resist

D. B. Shu; C. C. Li; J. F. Mancuso; Yung-Nien Sun

doi:10.1109/34.3875

A Line Extraction Method for Automated SEM Inspection of VLSI Resist

D. B. Shu, C. C. Li, J. F. Mancuso, Yung-Nien Sun

Department of Computer Science and Information Engineering

Research output: Contribution to journal › Article

21 Citations (Scopus)

Abstract

This correspondence presents a precision digital edge line detection method. It is developed for extracting edge contours of resist lines of submicron width as imaged by scanning electron microscopy. The accurate determination of resist edge lines is crucial for automatic measurement, microregistration and automatic detection of defects on resist lines.

Original language	English
Pages (from-to)	117-120
Number of pages	4
Journal	IEEE Transactions on Pattern Analysis and Machine Intelligence
Volume	10
Issue number	1
DOIs	https://doi.org/10.1109/34.3875
Publication status	Published - 1988 Jan 1

All Science Journal Classification (ASJC) codes

Software
Computer Vision and Pattern Recognition
Computational Theory and Mathematics
Artificial Intelligence
Applied Mathematics

Access to Document

10.1109/34.3875

Fingerprint Dive into the research topics of 'A Line Extraction Method for Automated SEM Inspection of VLSI Resist'. Together they form a unique fingerprint.

Cite this

Shu, D. B., Li, C. C., Mancuso, J. F., & Sun, Y-N. (1988). A Line Extraction Method for Automated SEM Inspection of VLSI Resist. IEEE Transactions on Pattern Analysis and Machine Intelligence, 10(1), 117-120. https://doi.org/10.1109/34.3875

@article{082699732f164281a69aee055d820f24,

title = "A Line Extraction Method for Automated SEM Inspection of VLSI Resist",

abstract = "This correspondence presents a precision digital edge line detection method. It is developed for extracting edge contours of resist lines of submicron width as imaged by scanning electron microscopy. The accurate determination of resist edge lines is crucial for automatic measurement, microregistration and automatic detection of defects on resist lines.",

author = "Shu, {D. B.} and Li, {C. C.} and Mancuso, {J. F.} and Yung-Nien Sun",

year = "1988",

month = jan,

day = "1",

doi = "10.1109/34.3875",

language = "English",

volume = "10",

pages = "117--120",

journal = "IEEE Transactions on Pattern Analysis and Machine Intelligence",

issn = "0162-8828",

publisher = "IEEE Computer Society",

number = "1",

}

TY - JOUR

T1 - A Line Extraction Method for Automated SEM Inspection of VLSI Resist

AU - Shu, D. B.

AU - Li, C. C.

AU - Mancuso, J. F.

AU - Sun, Yung-Nien

PY - 1988/1/1

Y1 - 1988/1/1

N2 - This correspondence presents a precision digital edge line detection method. It is developed for extracting edge contours of resist lines of submicron width as imaged by scanning electron microscopy. The accurate determination of resist edge lines is crucial for automatic measurement, microregistration and automatic detection of defects on resist lines.

AB - This correspondence presents a precision digital edge line detection method. It is developed for extracting edge contours of resist lines of submicron width as imaged by scanning electron microscopy. The accurate determination of resist edge lines is crucial for automatic measurement, microregistration and automatic detection of defects on resist lines.

UR - http://www.scopus.com/inward/record.url?scp=0023834841&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0023834841&partnerID=8YFLogxK

U2 - 10.1109/34.3875

DO - 10.1109/34.3875

M3 - Article

AN - SCOPUS:0023834841

VL - 10

SP - 117

EP - 120

JO - IEEE Transactions on Pattern Analysis and Machine Intelligence

JF - IEEE Transactions on Pattern Analysis and Machine Intelligence

SN - 0162-8828

IS - 1

ER -