@article{082699732f164281a69aee055d820f24,
title = "A Line Extraction Method for Automated SEM Inspection of VLSI Resist",
abstract = "This correspondence presents a precision digital edge line detection method. It is developed for extracting edge contours of resist lines of submicron width as imaged by scanning electron microscopy. The accurate determination of resist edge lines is crucial for automatic measurement, microregistration and automatic detection of defects on resist lines.",
author = "Shu, {D. B.} and Li, {C. C.} and Mancuso, {J. F.} and Sun, {Y. N.}",
note = "Funding Information: work was supported by the Ben Franklin Partnership Program of the Commonwealth of Pennsylvania and the Westinghouse Research and Development Center. D. B. Shu was with the Department of Electrical Engineering, University of Pittsburgh, Pittsburgh, PA 15261. He is now with Hughes Research Laboratories, Malibu, CA 90265. C. C. Li and Y. N. Sun are with the Department of Electrical Engineering, University of Pittsburgh, Pittsburgh, PA 15261. J. F. Mancuso was with the Material Science Division, Westinghouse Research and Development Center, Pittsburgh, PA 15235. He is now with Electro-Scan Corporation, Danvers, MA 01923. IEEE Log Number 8717229. Copyright: Copyright 2015 Elsevier B.V., All rights reserved.",
year = "1988",
month = jan,
doi = "10.1109/34.3875",
language = "English",
volume = "10",
pages = "117--120",
journal = "IEEE Transactions on Pattern Analysis and Machine Intelligence",
issn = "0162-8828",
publisher = "IEEE Computer Society",
number = "1",
}