A Line Extraction Method for Automated SEM Inspection of VLSI Resist

D. B. Shu, C. C. Li, J. F. Mancuso, Yung-Nien Sun

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

This correspondence presents a precision digital edge line detection method. It is developed for extracting edge contours of resist lines of submicron width as imaged by scanning electron microscopy. The accurate determination of resist edge lines is crucial for automatic measurement, microregistration and automatic detection of defects on resist lines.

Original languageEnglish
Pages (from-to)117-120
Number of pages4
JournalIEEE Transactions on Pattern Analysis and Machine Intelligence
Volume10
Issue number1
DOIs
Publication statusPublished - 1988 Jan 1

All Science Journal Classification (ASJC) codes

  • Software
  • Computer Vision and Pattern Recognition
  • Computational Theory and Mathematics
  • Artificial Intelligence
  • Applied Mathematics

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