Keyphrases
Low Pressure
100%
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
InP Heterojunction Bipolar Transistors
100%
Gallium Arsenide
50%
Current Gain
50%
AlGaAs
50%
InGaAs
50%
Valence Band Discontinuity
50%
Band Discontinuity
50%
Offset Voltage
50%
Heterojunction
50%
Lattice Matching
50%
Hole Confinement
50%
Engineering
Vapor Deposition
100%
Heterojunctions
100%
Bipolar Transistor
100%
Chemical Vapor Deposition
100%
Gallium Arsenide
33%
Current Gain
33%
Conduction Band
33%
Aluminium Gallium Arsenide
33%
Valence Band
33%
Offset Voltage
33%
Indium Gallium Arsenide
33%
Earth and Planetary Sciences
Metalorganic Chemical Vapor Deposition
100%
Heterojunctions
100%
Bipolar Transistor
100%
Aluminum Gallium Arsenide
33%
Conduction Band
33%
Emitter
33%
Spike Potential
33%
Material Science
Heterojunction
100%
Chemical Vapor Deposition
100%
Bipolar Transistor
100%
Density
33%
GaAs/AlGaAs
33%
Indium Gallium Arsenide
33%
Physics
Metalorganic Chemical Vapor Deposition
100%
Heterojunctions
100%
Bipolar Transistor
100%
Conduction Band
33%
Chemical Engineering
Metallorganic Chemical Vapor Deposition
100%
Aluminum Gallium Arsenide
50%