@inproceedings{34bf58948a4b45acaccf211d4355b323,
title = "A new observation in hot-carrier induced drain current degradation in deep-sub-micrometer nMOSFETs",
abstract = "Hot-carrier induced drain current degradation in 0.18 μm nMOSFETs is investigated. Results show that drain current characterized at drain voltage higher than 0.1 V exhibits the most degradation. This new observation is attributed to two competing mechanisms as the characterization drain voltage increases: reduction in channel inversion charges, and reduction in charged interface states. The characteristic of drain current degradation vs. characterization drain voltage is flatter when the device is stressed under high temperature and forward body-bias.",
author = "Chen, {J. F.} and Tsao, {C. P.}",
note = "Publisher Copyright: {\textcopyright} 2002 IEEE.; 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2002 ; Conference date: 12-07-2002",
year = "2002",
doi = "10.1109/IPFA.2002.1025607",
language = "English",
series = "Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "31--34",
editor = "Chim, {Wai Kin} and John Thong and Wilson Tan and Lee, {Kheng Chooi}",
booktitle = "Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2002",
address = "United States",
}