A nonlinear three-dimensional rupture theory of thin liquid films

Chi-Chuan Hwang, Chaur Kie Lin, Wu Yih Uen

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

A process of nonlinear three-dimensional rupture of thin liquid films is numerically analyzed for the first time, With the rupture time being successfully calculated, it has been possible to develop a more complete rupture theory for thin liquid films. In contrast to the linear analysis indicating the shortest rupture time of thin liquid films to be the same for both two- and three-dimensional rupture, the nonlinear analysis reveals that the latter proceeds faster than the former. In particular, among all three-dimensional disturbance modes, the symmetric one makes the thin liquid films rupture fastest. It is concluded that the rupture process develops at a point rather than along a line on thin liquid films.

Original languageEnglish
Pages (from-to)250-252
Number of pages3
JournalJournal of Colloid And Interface Science
Volume190
Issue number1
DOIs
Publication statusPublished - 1997 Jun 1

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Liquid films
Thin films
Nonlinear analysis

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Surfaces, Coatings and Films
  • Colloid and Surface Chemistry

Cite this

@article{ef6cbb365b02442f8c2f2aaf49c4fc3c,
title = "A nonlinear three-dimensional rupture theory of thin liquid films",
abstract = "A process of nonlinear three-dimensional rupture of thin liquid films is numerically analyzed for the first time, With the rupture time being successfully calculated, it has been possible to develop a more complete rupture theory for thin liquid films. In contrast to the linear analysis indicating the shortest rupture time of thin liquid films to be the same for both two- and three-dimensional rupture, the nonlinear analysis reveals that the latter proceeds faster than the former. In particular, among all three-dimensional disturbance modes, the symmetric one makes the thin liquid films rupture fastest. It is concluded that the rupture process develops at a point rather than along a line on thin liquid films.",
author = "Chi-Chuan Hwang and Lin, {Chaur Kie} and Uen, {Wu Yih}",
year = "1997",
month = "6",
day = "1",
doi = "10.1006/jcis.1997.4867",
language = "English",
volume = "190",
pages = "250--252",
journal = "Journal of Colloid and Interface Science",
issn = "0021-9797",
publisher = "Academic Press Inc.",
number = "1",

}

A nonlinear three-dimensional rupture theory of thin liquid films. / Hwang, Chi-Chuan; Lin, Chaur Kie; Uen, Wu Yih.

In: Journal of Colloid And Interface Science, Vol. 190, No. 1, 01.06.1997, p. 250-252.

Research output: Contribution to journalArticle

TY - JOUR

T1 - A nonlinear three-dimensional rupture theory of thin liquid films

AU - Hwang, Chi-Chuan

AU - Lin, Chaur Kie

AU - Uen, Wu Yih

PY - 1997/6/1

Y1 - 1997/6/1

N2 - A process of nonlinear three-dimensional rupture of thin liquid films is numerically analyzed for the first time, With the rupture time being successfully calculated, it has been possible to develop a more complete rupture theory for thin liquid films. In contrast to the linear analysis indicating the shortest rupture time of thin liquid films to be the same for both two- and three-dimensional rupture, the nonlinear analysis reveals that the latter proceeds faster than the former. In particular, among all three-dimensional disturbance modes, the symmetric one makes the thin liquid films rupture fastest. It is concluded that the rupture process develops at a point rather than along a line on thin liquid films.

AB - A process of nonlinear three-dimensional rupture of thin liquid films is numerically analyzed for the first time, With the rupture time being successfully calculated, it has been possible to develop a more complete rupture theory for thin liquid films. In contrast to the linear analysis indicating the shortest rupture time of thin liquid films to be the same for both two- and three-dimensional rupture, the nonlinear analysis reveals that the latter proceeds faster than the former. In particular, among all three-dimensional disturbance modes, the symmetric one makes the thin liquid films rupture fastest. It is concluded that the rupture process develops at a point rather than along a line on thin liquid films.

UR - http://www.scopus.com/inward/record.url?scp=0031171130&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031171130&partnerID=8YFLogxK

U2 - 10.1006/jcis.1997.4867

DO - 10.1006/jcis.1997.4867

M3 - Article

AN - SCOPUS:0031171130

VL - 190

SP - 250

EP - 252

JO - Journal of Colloid and Interface Science

JF - Journal of Colloid and Interface Science

SN - 0021-9797

IS - 1

ER -