A nonlinear three-dimensional rupture theory of thin liquid films

Chi Chuan Hwang, Chaur Kie Lin, Wu Yih Uen

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)


A process of nonlinear three-dimensional rupture of thin liquid films is numerically analyzed for the first time, With the rupture time being successfully calculated, it has been possible to develop a more complete rupture theory for thin liquid films. In contrast to the linear analysis indicating the shortest rupture time of thin liquid films to be the same for both two- and three-dimensional rupture, the nonlinear analysis reveals that the latter proceeds faster than the former. In particular, among all three-dimensional disturbance modes, the symmetric one makes the thin liquid films rupture fastest. It is concluded that the rupture process develops at a point rather than along a line on thin liquid films.

Original languageEnglish
Pages (from-to)250-252
Number of pages3
JournalJournal of Colloid And Interface Science
Issue number1
Publication statusPublished - 1997 Jun 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Surfaces, Coatings and Films
  • Colloid and Surface Chemistry


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