A novel crystal defect in epitaxial wurtzite gallium nitride film

S. Q. Wang, C. P. Liu

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


A novel structure defect in epitaxial wurtzite GaN film is reported in this paper. It is observed as an isolated (112̄0) planar defect within one large perfect crystal area by high-resolution electron microscopy. By careful analysis of the experimental atomic image it is found that the atomic structure is composed of Ga-Ga and N-N like-atom bonds. It forms a segment of a high-energy boundary by theoretical considerations. The reason for the defect formation is explained from the mechanism of epitaxial film growth. The defect is considered an incipient (112̄0) edge dislocation.

Original languageEnglish
Pages (from-to)202-207
Number of pages6
JournalMaterials Letters
Issue number3
Publication statusPublished - 1999 Feb

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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