A novel liquid thermal polymerization resist for nanoimprint lithography with low shrinkage and high flowability

Wen Chang Liao, Lien-Chung Hsu

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

A novel liquid thermal polymerization resist was prepared for nanoimprint lithography on flexible plastic substrates. The resist is a mixture of poly(methyl methacrylate) (PMMA), methylmethacrylate (MMA), n-butylacrylate (n-BA), methacrylic acid (MAA) and 2,2′-azobisisobutyronitrile (AIBN). The resist can be imprinted at room temperature with a pressure of 1.2 MPa, and then cured at 95°C to obtain nano-scaled and micro-scaled patterns. Replications of high-density line and space patterns with resolutions of 50 and 100 nm were obtained on a flexible ITO/PET substrate. The liquid resist has low viscosity, and shows a near-zero residual layer at the bottom of the pattern. Due to the addition of PMMA as the binder, the shrinkage of the resist after curing is only 2.01%.

Original languageEnglish
Article number065303
JournalNanotechnology
Volume18
Issue number6
DOIs
Publication statusPublished - 2007 Feb 14

Fingerprint

Nanoimprint lithography
Polymethyl Methacrylate
Polymethyl methacrylates
Polymerization
Methylmethacrylate
Liquids
Substrates
Binders
Curing
Viscosity
Plastics
Acids
Temperature
Hot Temperature
azobis(isobutyronitrile)
methacrylic acid

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

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abstract = "A novel liquid thermal polymerization resist was prepared for nanoimprint lithography on flexible plastic substrates. The resist is a mixture of poly(methyl methacrylate) (PMMA), methylmethacrylate (MMA), n-butylacrylate (n-BA), methacrylic acid (MAA) and 2,2′-azobisisobutyronitrile (AIBN). The resist can be imprinted at room temperature with a pressure of 1.2 MPa, and then cured at 95°C to obtain nano-scaled and micro-scaled patterns. Replications of high-density line and space patterns with resolutions of 50 and 100 nm were obtained on a flexible ITO/PET substrate. The liquid resist has low viscosity, and shows a near-zero residual layer at the bottom of the pattern. Due to the addition of PMMA as the binder, the shrinkage of the resist after curing is only 2.01{\%}.",
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A novel liquid thermal polymerization resist for nanoimprint lithography with low shrinkage and high flowability. / Liao, Wen Chang; Hsu, Lien-Chung.

In: Nanotechnology, Vol. 18, No. 6, 065303, 14.02.2007.

Research output: Contribution to journalArticle

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