A novel positive photosensitive polybenzoxazole based on a tetrahydropyranyl (THP) protected polyhydroxyamide

Steve Lien Chung Hsu, Wan Chi Chen, Po I. Lee

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

A new positive working, aqueous base developable photosensitive polybenzoxazole (PBO) precursor composition based on a partially tetrahydropyranyl (THP) protected PBO precursor and a Bisphenol A based 1,2-naphthoquinone diazide-4-sulfonate (DNQ-4) photosensitive compound has been developed. The polymer was prepared from a low temperature polymerization of 2, 2'-bis-(3-amino-4-hydroxyphenyl) hexafluoropropane (BisAPAF) and isophthaloyl chloride (IC), followed by reacting with 3,4-Dihydro-2H-pyran in the presence of p-toluenesulfonic acid monohydrate as a catalyst. The photosensitive PBO precursor containing 20wt % DNQ-4 photosensitive compound showed a sensitivity of 221 mJ/cm2 and a contrast of 1.44 in a 3μm film with a 0.6wt % tetramethylammonium hydroxide (TMAH) developer. A pattern with a resolution of 10 μm was obtained from this composition. The novel PBO precursor photosensitive composition showed a significant improvement in dark film loss after development, which can and could be used to make a thick film resist.

Original languageEnglish
Pages (from-to)295-302
Number of pages8
JournalPolymer Bulletin
Volume50
Issue number5-6
DOIs
Publication statusPublished - 2003 Jul 1

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Polymers and Plastics
  • Materials Chemistry

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