Abstract
In this study, copper indium diselenide (CIS) films were synthesized from electrodeposited Cu-Se-In-Se precursors by three step annealing. The Se layer between Cu and In layer was grown to prevent the formation of Cu/In compound. The Cu-Se precursors were first annealed to grow uniform and conductive Cu 2Se surface. After deposition of the four layers precursors, two steps annealing was employed to form Cu 2Se-In 2Se 3 precursors. Transforming Cu 2Se-In 2Se 3 to CIS required less thermal energy. Therefore, high quality CIS film can be synthesized by two steps annealing due to its high crystallinity. The properties of the CIS films were characterized by scanning electron microscopy (SEM), X-ray Diffraction (XRD), and Raman Spectra.
Original language | English |
---|---|
Pages (from-to) | 7226-7232 |
Number of pages | 7 |
Journal | Journal of Nanoscience and Nanotechnology |
Volume | 12 |
Issue number | 9 |
DOIs | |
Publication status | Published - 2012 Sept 1 |
All Science Journal Classification (ASJC) codes
- Bioengineering
- General Chemistry
- Biomedical Engineering
- General Materials Science
- Condensed Matter Physics