@inproceedings{d97f495639114c35bfecf9e5fd699958,
title = "A preliminary study of automated inspection of VLSI resist patterns",
abstract = "This paper presents our progress on automated inspection of VLSI resist patterns as imaged by scanning electron microscopy. A precision digital edge line detection method has been developed for extracting edge contours of resist lines of sub-micron width, which are crucial for micro registration and detection of defects including bubbles and holes, resist stringers and resist edge defects.",
author = "Li, {C. C.} and Mancuso, {J. F.} and Shu, {D. B.} and Sun, {Y. N.} and Roth, {L. D.}",
note = "Funding Information: ___ *This research is supported by the Ben Franklin Program of the Commonwealth of Pennsylvania and the Westinghouse Research and Development Center. t J.F. Mancuso is presently with JEOL, Peabody,MA 01960 Publisher Copyright: {\textcopyright} 1985 IEEE.; 2nd IEEE International Conference on Robotics and Automation, ICRA 1985 ; Conference date: 25-03-1985 Through 28-03-1985",
year = "1985",
doi = "10.1109/ROBOT.1985.1087244",
language = "English",
isbn = "0818606150",
series = "Proceedings - IEEE International Conference on Robotics and Automation",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "474--480",
booktitle = "Proceedings - 1985 IEEE International Conference on Robotics and Automation, ICRA 1985",
address = "United States",
}