A preliminary study of automated inspection of VLSI resist patterns

C. C. Li, J. F. Mancuso, D. B. Shu, Y. N. Sun, L. D. Roth

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

This paper presents our progress on automated inspection of VLSI resist patterns as imaged by scanning electron microscopy. A precision digital edge line detection method has been developed for extracting edge contours of resist lines of sub-micron width, which are crucial for micro registration and detection of defects including bubbles and holes, resist stringers and resist edge defects.

Original languageEnglish
Title of host publicationProceedings - 1985 IEEE International Conference on Robotics and Automation, ICRA 1985
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages474-480
Number of pages7
ISBN (Print)0818606150
DOIs
Publication statusPublished - 1985 Jan 1
Event2nd IEEE International Conference on Robotics and Automation, ICRA 1985 - St. Louis, United States
Duration: 1985 Mar 251985 Mar 28

Publication series

NameProceedings - IEEE International Conference on Robotics and Automation
ISSN (Print)1050-4729

Conference

Conference2nd IEEE International Conference on Robotics and Automation, ICRA 1985
CountryUnited States
CitySt. Louis
Period85-03-2585-03-28

All Science Journal Classification (ASJC) codes

  • Software
  • Control and Systems Engineering
  • Artificial Intelligence
  • Electrical and Electronic Engineering

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