TY - JOUR
T1 - A review of metrology for nanoelectronics
AU - Galatsis, Kosmas
AU - Potok, Ron
AU - Wang, Kang L.
N1 - Funding Information:
Manuscript received June 11, 2007; revised July 23, 2007. This work was supported in part by the Focus Center Research Program (FCRP) Center of Functional Engineered Nano Architectonics (FENA) and in part by the National Science Foundation (NSF) Nanoscale Science and Engineering Center (NSEC) for the Nanoprobing and the California Institute of Technology (CNSI).
Funding Information:
Abstract—This paper highlights some new and old techniques that will have important metrology inroads for nanoelectronics beyond CMOS. Traditional electron microscopy techniques are envisioned to remain and play a core role at the nanoscale level, and others such as probing techniques and special holographic imaging will further be enhanced and provide more diverse capabilities. The paper presents metrology techniques for beyond CMOS as presented at the First Metrology for Beyond CMOS workshop hosted by the Focus Center Research Program Center of Functional Engineered Nano Architectonics, the National Science Foundation Nanoscale Science and Engineering Center for Nanoprobing, and the California Institute of Technology (CNSI).
Funding Information:
The authors wish to thank all contributing participants of the “Workshop on Metrology Beyond CMOS” San Francisco, December 14th, 2006: Focus Center Research Program (FCRP) Center on Functional Engineered Nano Architectonics (FENA) and the National Science Foundation (NSF) Nanoscale Science and Engineering Center (NSEC) Center for Probing the Nanoscale and the California Institute of Nanosystems (CNSI) at UCLA, 2006.
PY - 2007/11
Y1 - 2007/11
N2 - This paper highlights some new and old techniques that will have important metrology inroads for nanoelectronics beyond CMOS. Traditional electron microscopy techniques are envisioned to remain and play a core role at the nanoscale level, and others such as probing techniques and special holographic imaging will further be enhanced and provide more diverse capabilities. The paper presents metrology techniques for beyond CMOS as presented at the First Metrology for Beyond CMOS workshop hosted by the Focus Center Research Program Center of Functional Engineered Nano Architectonics, the National Science Foundation Nanoscale Science and Engineering Center for Nanoprobing, and the California Institute of Technology (CNSI).
AB - This paper highlights some new and old techniques that will have important metrology inroads for nanoelectronics beyond CMOS. Traditional electron microscopy techniques are envisioned to remain and play a core role at the nanoscale level, and others such as probing techniques and special holographic imaging will further be enhanced and provide more diverse capabilities. The paper presents metrology techniques for beyond CMOS as presented at the First Metrology for Beyond CMOS workshop hosted by the Focus Center Research Program Center of Functional Engineered Nano Architectonics, the National Science Foundation Nanoscale Science and Engineering Center for Nanoprobing, and the California Institute of Technology (CNSI).
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U2 - 10.1109/TSM.2007.907631
DO - 10.1109/TSM.2007.907631
M3 - Review article
AN - SCOPUS:64149102358
SN - 0894-6507
VL - 20
SP - 542
EP - 548
JO - IEEE Transactions on Semiconductor Manufacturing
JF - IEEE Transactions on Semiconductor Manufacturing
IS - 4
M1 - 4369336
ER -