A silicon oxide hard coating deposited on flexible substrate by TMS - PECVD system

Day Shan Liu, Yu Ko Liao, Cheng Yang Wu, Fuh Shyang Juang, Ching Ting Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)


A hard coating silicon oxide film was deposited on flexible substrates by a PECVD system. Tertramethylsilane (TMS) and oxygen were employed as raw materials. Surface roughness and hardness of these films deposited under various TMS/O2 gas flow ratio, rf power and chamber pressure were investigated. At adequate fabricated conditions, the original surface roughness of PMMA (∼ 3.36 nm) and PC (∼ 1.38 nm) substrates was markedly flatted to 1.52 and 0.39 nm, respectively. Meanwhile, the surface hardness of coated PMMA and PC substrates was also enhanced to 6.077 GPa and 3.978 GPa, respectively. The hardness of silicon oxide film deposited by TMS-PECVD system was superior to silicon oxide films prepared from e-beam evaporation and dipping technologies.

Original languageEnglish
Title of host publicationProgress on Advanced Manufacture for Micro/Nano Technology 2005 - Proceedings of the 2005 International Conference on Advanced Manufacture
PublisherTrans Tech Publications Ltd
Number of pages6
EditionPART 1
ISBN (Print)0878499903, 9780878499908
Publication statusPublished - 2006 Jan 1
Event2005 International Conference on Advanced Manufacture, ICAM2005 - Taipei, R.O.C., Taiwan
Duration: 2005 Nov 282005 Dec 2

Publication series

NameMaterials Science Forum
NumberPART 1
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752


Other2005 International Conference on Advanced Manufacture, ICAM2005
CityTaipei, R.O.C.

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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