A silicon oxide hard coating deposited on flexible substrate by TMS - PECVD system

Day Shan Liu, Yu Ko Liao, Cheng Yang Wu, Fuh Shyang Juang, Ching Ting Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

A hard coating silicon oxide film was deposited on flexible substrates by a PECVD system. Tertramethylsilane (TMS) and oxygen were employed as raw materials. Surface roughness and hardness of these films deposited under various TMS/O2 gas flow ratio, rf power and chamber pressure were investigated. At adequate fabricated conditions, the original surface roughness of PMMA (∼ 3.36 nm) and PC (∼ 1.38 nm) substrates was markedly flatted to 1.52 and 0.39 nm, respectively. Meanwhile, the surface hardness of coated PMMA and PC substrates was also enhanced to 6.077 GPa and 3.978 GPa, respectively. The hardness of silicon oxide film deposited by TMS-PECVD system was superior to silicon oxide films prepared from e-beam evaporation and dipping technologies.

Original languageEnglish
Title of host publicationProgress on Advanced Manufacture for Micro/Nano Technology 2005 - Proceedings of the 2005 International Conference on Advanced Manufacture
PublisherTrans Tech Publications Ltd
Pages439-444
Number of pages6
EditionPART 1
ISBN (Print)0878499903, 9780878499908
DOIs
Publication statusPublished - 2006 Jan 1
Event2005 International Conference on Advanced Manufacture, ICAM2005 - Taipei, R.O.C., Taiwan
Duration: 2005 Nov 282005 Dec 2

Publication series

NameMaterials Science Forum
NumberPART 1
Volume505-507
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Other

Other2005 International Conference on Advanced Manufacture, ICAM2005
CountryTaiwan
CityTaipei, R.O.C.
Period05-11-2805-12-02

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'A silicon oxide hard coating deposited on flexible substrate by TMS - PECVD system'. Together they form a unique fingerprint.

  • Cite this

    Liu, D. S., Liao, Y. K., Wu, C. Y., Juang, F. S., & Lee, C. T. (2006). A silicon oxide hard coating deposited on flexible substrate by TMS - PECVD system. In Progress on Advanced Manufacture for Micro/Nano Technology 2005 - Proceedings of the 2005 International Conference on Advanced Manufacture (PART 1 ed., pp. 439-444). (Materials Science Forum; Vol. 505-507, No. PART 1). Trans Tech Publications Ltd. https://doi.org/10.4028/0-87849-990-3.439