A study at room temperature and 55°C on the charge-discharge characteristics of Si(100-x)Alx thin film anode for Li-ion batteries

Yueh Ting Shih; Chao Han Wu; Fei-Yi Hung; Truan-Sheng Lui; Li Hui Chen

doi:10.1016/j.surfcoat.2012.07.097

A study at room temperature and 55°C on the charge-discharge characteristics of Si_(100-x)Al_x thin film anode for Li-ion batteries

Yueh Ting Shih, Chao Han Wu, Fei-Yi Hung, Truan-Sheng Lui, Li Hui Chen

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

In this study, Al was added into Si matrix as the buffer (Si90Al10, Si75Al25 and Si55Al45) by co-sputtering to prevent the dramatic volumetric expansion of a pure Si thin film anode during lithiation and delithiation. The electrochemical properties and structural characteristics of Si_(100-x)Al_x (at.%) films at room temperature and 55°C were investigated. At 55°C, the higher lithiation and delithiation quantity was accompanied by a dramatic volumetric expansion which increased the capacity but degraded the stability. In addition, the resistance against electrochemical reactions was controlled by the diffusion rate of lithium ions at 55°C. After charge-discharge, the Si-Al thin film had undergone recrystallization and had been affecting the 55°C charge-discharge characteristics of the thin film anodes.

Original language	English
Pages (from-to)	79-84
Number of pages	6
Journal	Surface and Coatings Technology
Volume	215
DOIs	https://doi.org/10.1016/j.surfcoat.2012.07.097
Publication status	Published - 2013 Jan 25

All Science Journal Classification (ASJC) codes

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Access to Document

10.1016/j.surfcoat.2012.07.097

Fingerprint Dive into the research topics of 'A study at room temperature and 55°C on the charge-discharge characteristics of Si<sub>(100-x)</sub>Al<sub>x</sub> thin film anode for Li-ion batteries'. Together they form a unique fingerprint.

Cite this

@article{0fe351729a79430fbdaf9909dcfd278e,

title = "A study at room temperature and 55°C on the charge-discharge characteristics of Si(100-x)Alx thin film anode for Li-ion batteries",

abstract = "In this study, Al was added into Si matrix as the buffer (Si90Al10, Si75Al25 and Si55Al45) by co-sputtering to prevent the dramatic volumetric expansion of a pure Si thin film anode during lithiation and delithiation. The electrochemical properties and structural characteristics of Si(100-x)Alx (at.%) films at room temperature and 55°C were investigated. At 55°C, the higher lithiation and delithiation quantity was accompanied by a dramatic volumetric expansion which increased the capacity but degraded the stability. In addition, the resistance against electrochemical reactions was controlled by the diffusion rate of lithium ions at 55°C. After charge-discharge, the Si-Al thin film had undergone recrystallization and had been affecting the 55°C charge-discharge characteristics of the thin film anodes.",

author = "Shih, {Yueh Ting} and Wu, {Chao Han} and Fei-Yi Hung and Truan-Sheng Lui and Chen, {Li Hui}",

year = "2013",

month = jan,

day = "25",

doi = "10.1016/j.surfcoat.2012.07.097",

language = "English",

volume = "215",

pages = "79--84",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier",

}

TY - JOUR

T1 - A study at room temperature and 55°C on the charge-discharge characteristics of Si(100-x)Alx thin film anode for Li-ion batteries

AU - Shih, Yueh Ting

AU - Wu, Chao Han

AU - Hung, Fei-Yi

AU - Lui, Truan-Sheng

AU - Chen, Li Hui

PY - 2013/1/25

Y1 - 2013/1/25

N2 - In this study, Al was added into Si matrix as the buffer (Si90Al10, Si75Al25 and Si55Al45) by co-sputtering to prevent the dramatic volumetric expansion of a pure Si thin film anode during lithiation and delithiation. The electrochemical properties and structural characteristics of Si(100-x)Alx (at.%) films at room temperature and 55°C were investigated. At 55°C, the higher lithiation and delithiation quantity was accompanied by a dramatic volumetric expansion which increased the capacity but degraded the stability. In addition, the resistance against electrochemical reactions was controlled by the diffusion rate of lithium ions at 55°C. After charge-discharge, the Si-Al thin film had undergone recrystallization and had been affecting the 55°C charge-discharge characteristics of the thin film anodes.

AB - In this study, Al was added into Si matrix as the buffer (Si90Al10, Si75Al25 and Si55Al45) by co-sputtering to prevent the dramatic volumetric expansion of a pure Si thin film anode during lithiation and delithiation. The electrochemical properties and structural characteristics of Si(100-x)Alx (at.%) films at room temperature and 55°C were investigated. At 55°C, the higher lithiation and delithiation quantity was accompanied by a dramatic volumetric expansion which increased the capacity but degraded the stability. In addition, the resistance against electrochemical reactions was controlled by the diffusion rate of lithium ions at 55°C. After charge-discharge, the Si-Al thin film had undergone recrystallization and had been affecting the 55°C charge-discharge characteristics of the thin film anodes.

UR - http://www.scopus.com/inward/record.url?scp=84872675055&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84872675055&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2012.07.097

DO - 10.1016/j.surfcoat.2012.07.097

M3 - Article

AN - SCOPUS:84872675055

VL - 215

SP - 79

EP - 84

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

ER -