A study on adhesion and footing issues of HMDSO films as bottom antireflective coating for deep UV lithographies

C. H. Lin; H. L. Chen; L. A. Wang

doi:10.1016/S0167-9317(01)00501-9

A study on adhesion and footing issues of HMDSO films as bottom antireflective coating for deep UV lithographies

C. H. Lin, H. L. Chen, L. A. Wang

Department of Photonics

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

The resist adhesion property of PECVD deposited hexamethyldisiloxane (HMDSO) films and related footing issues at the resist/BARC interface are evaluated. Larger work of adhesion between HMDSO films and photoresists and smaller stresses of coated HMDSO films are shown with higher O₂/HMDSO flow rate ratios. The adhesion property of HMDSO films is significantly enhanced by applying O₂ plasma treatment. No footing is found in resist profiles, which is consistent with the measurement result of thermal desorbing.

Original language	English
Article number	S0167-9317(01)00501-9
Pages (from-to)	555-561
Number of pages	7
Journal	Microelectronic Engineering
Volume	57-58
DOIs	https://doi.org/10.1016/S0167-9317(01)00501-9
Publication status	Published - 2001

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/S0167-9317(01)00501-9

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abstract = "The resist adhesion property of PECVD deposited hexamethyldisiloxane (HMDSO) films and related footing issues at the resist/BARC interface are evaluated. Larger work of adhesion between HMDSO films and photoresists and smaller stresses of coated HMDSO films are shown with higher O2/HMDSO flow rate ratios. The adhesion property of HMDSO films is significantly enhanced by applying O2 plasma treatment. No footing is found in resist profiles, which is consistent with the measurement result of thermal desorbing.",

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AU - Chen, H. L.

AU - Wang, L. A.

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AB - The resist adhesion property of PECVD deposited hexamethyldisiloxane (HMDSO) films and related footing issues at the resist/BARC interface are evaluated. Larger work of adhesion between HMDSO films and photoresists and smaller stresses of coated HMDSO films are shown with higher O2/HMDSO flow rate ratios. The adhesion property of HMDSO films is significantly enhanced by applying O2 plasma treatment. No footing is found in resist profiles, which is consistent with the measurement result of thermal desorbing.

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JF - Microelectronic Engineering

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ER -

A study on adhesion and footing issues of HMDSO films as bottom antireflective coating for deep UV lithographies

Abstract

All Science Journal Classification (ASJC) codes

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