Abstract
A new tristate switching device, prepared by molecular beam epitaxy (MBE), has been fabricated and demonstrated. A double delta-doped quantum well structure was employed in the device studied. The intentionally different doping levels of δ(p+) and δ(n+) delta-doped sheets cause significantly different barrier heights for electron and hole injection. When external bias is applied, an interesting sequentially-double S-shaped negative-differential-resistance (NDR) phenomenon is observed. This introduces triple stable regimes of the device operation. Therefore, based on a proper design, the studied structure has a good potential for multiple-valued logic circuit applications.
Original language | English |
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Pages (from-to) | 1089-1092 |
Number of pages | 4 |
Journal | Solid State Electronics |
Volume | 36 |
Issue number | 8 |
DOIs | |
Publication status | Published - 1993 Aug |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry