A tristate switching device with double delta-doped quantum well structure

Wei Chou Hsu, Der Feng Guo, Wen Chau Liu, Wen Shiung Lour

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

A new tristate switching device, prepared by molecular beam epitaxy (MBE), has been fabricated and demonstrated. A double delta-doped quantum well structure was employed in the device studied. The intentionally different doping levels of δ(p+) and δ(n+) delta-doped sheets cause significantly different barrier heights for electron and hole injection. When external bias is applied, an interesting sequentially-double S-shaped negative-differential-resistance (NDR) phenomenon is observed. This introduces triple stable regimes of the device operation. Therefore, based on a proper design, the studied structure has a good potential for multiple-valued logic circuit applications.

Original languageEnglish
Pages (from-to)1089-1092
Number of pages4
JournalSolid State Electronics
Volume36
Issue number8
DOIs
Publication statusPublished - 1993 Aug

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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