A zno-nanowire phototransistor prepared on glass substrates

W. Y. Weng, S. J. Chang, C. L. Hsu, T. J. Hsueh

Research output: Contribution to journalArticlepeer-review

64 Citations (Scopus)


The fabrication of a phototransistor via the bridging of two prefabricated electrodes with a laterally grown ZnO nanowire is reported. It was found that the fabricated device is an n-channel enhancement-mode phototransistor with a dark carrier concentration of 6.34×1017 cm-3 when the gate voltage is biased at 5 V. With an incident-light wavelength of 360 nm and a zero gate bias, it was found that the noise equivalent power and normalized detectivity (D*) of the fabricated ZnOphototransistor were 6.67 × 10-17 W and 1.27 × 1013 cm Hz0.5 W-1, respectively. It was also found that the current in the device can be modulated efficiently by tuning the wavelength of the excitation source.

Original languageEnglish
Pages (from-to)162-166
Number of pages5
JournalACS Applied Materials and Interfaces
Issue number2
Publication statusPublished - 2011 Feb 23

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

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