Abstract
The temperature dependences of lateral conductivity and hole mobility in SiGe quantum well structures selectively doped with boron are presented. The boron A+ centers are found to exist and determine the low-temperature conductivity. The activation energy of conductivity at higher temperatures is shown to be determined by the energy distance between strain-split boron A0 centers. The model of two-stage excitation of free holes including the thermal activation of holes from the ground to split-off state and next tunneling into the valence band is proposed. The binding energy of A+ centers and the energy splitting of boron ground states by strain are found.
Original language | English |
---|---|
Pages (from-to) | 91-96 |
Number of pages | 6 |
Journal | Materials Science Forum |
Volume | 258-263 |
Issue number | PART 1 |
DOIs | |
Publication status | Published - 1997 |
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering