Active layer thickness effects on the on-state current and pulse measurement at room temperature on deposited zinc oxide thin-film transistors

Sarbani Basu, Pramod K. Singh, C. Ghanshyam, Pawan Kapur, Yeong-Her Wang

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

This study reports on the fabrication of thin-film transistors (TFTs) with transparent zinc oxide (ZnO) semiconductors serving as the active channel and silicon dioxide (SiO 2 ) serving as the gate insulator. The ZnO films were deposited by radiofrequency magnetron sputtering at room temperature. Moreover, the effects of channel thickness on the structural and pulse current-voltage characteristics of ZnO TFTs using a bottom gate configuration were investigated. As the channel thickness increased, the crystalline quality and the channel conductance were enhanced. The electrical characteristics of TFTs exhibited field-effect mobilities of 8.36 cm 2 /Vs to 16.40 cm 2 /Vs and on-to-off current ratios of 10 8 to 10 7 for ZnO layer thickness of 45 nm and 70 nm, respectively. The threshold voltage was in the range of 10 V to 31 V for ZnO layer thicknesses from 35 nm to 70 nm, respectively. The low deposition and processing temperatures make these TFTs suitable for fabrication on flexible substrates.

Original languageEnglish
Pages (from-to)2362-2368
Number of pages7
JournalJournal of Electronic Materials
Volume41
Issue number9
DOIs
Publication statusPublished - 2012 Sep 1

Fingerprint

Zinc Oxide
Thin film transistors
Zinc oxide
zinc oxides
Oxide films
transistors
room temperature
thin films
pulses
Temperature
Fabrication
fabrication
Current voltage characteristics
dioxides
Threshold voltage
Silicon Dioxide
threshold voltage
Magnetron sputtering
oxide films
magnetron sputtering

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this

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title = "Active layer thickness effects on the on-state current and pulse measurement at room temperature on deposited zinc oxide thin-film transistors",
abstract = "This study reports on the fabrication of thin-film transistors (TFTs) with transparent zinc oxide (ZnO) semiconductors serving as the active channel and silicon dioxide (SiO 2 ) serving as the gate insulator. The ZnO films were deposited by radiofrequency magnetron sputtering at room temperature. Moreover, the effects of channel thickness on the structural and pulse current-voltage characteristics of ZnO TFTs using a bottom gate configuration were investigated. As the channel thickness increased, the crystalline quality and the channel conductance were enhanced. The electrical characteristics of TFTs exhibited field-effect mobilities of 8.36 cm 2 /Vs to 16.40 cm 2 /Vs and on-to-off current ratios of 10 8 to 10 7 for ZnO layer thickness of 45 nm and 70 nm, respectively. The threshold voltage was in the range of 10 V to 31 V for ZnO layer thicknesses from 35 nm to 70 nm, respectively. The low deposition and processing temperatures make these TFTs suitable for fabrication on flexible substrates.",
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Active layer thickness effects on the on-state current and pulse measurement at room temperature on deposited zinc oxide thin-film transistors. / Basu, Sarbani; Singh, Pramod K.; Ghanshyam, C.; Kapur, Pawan; Wang, Yeong-Her.

In: Journal of Electronic Materials, Vol. 41, No. 9, 01.09.2012, p. 2362-2368.

Research output: Contribution to journalArticle

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AU - Basu, Sarbani

AU - Singh, Pramod K.

AU - Ghanshyam, C.

AU - Kapur, Pawan

AU - Wang, Yeong-Her

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