Adaptive Genetic Algorithm for Lithography Scheduling in Semiconductor DRAM Fab.

Chia-Yen Lee, C. M. Wu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publication2019 IEEE 15th International Conference on Automation Science and Engineering (CASE)
Place of PublicationVancouver, BC, Canada
Publication statusPublished - 2019

Cite this

Lee, C-Y., & Wu, C. M. (2019). Adaptive Genetic Algorithm for Lithography Scheduling in Semiconductor DRAM Fab. In 2019 IEEE 15th International Conference on Automation Science and Engineering (CASE)