Adsorption and decomposition of monoethanolamine on Cu(100)

Lin Yi-Shiue, Lin Jain-Shiun, Wang Ching-Yung, Kuo Che-Wei, Jong-Liang Lin

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Temperature-programmed reaction/desorption and reflection-absorption infrared spectroscopy have been employed to investigate the adsorption and decomposition of HOCH 2CH 2NH 2 on Cu(100). HOCH 2CH 2NH 2 molecules desorb from the multilayer and monolayer with a maximum rate at 203 and 255 K, respectively. The desorption state at 255 K corresponds to an adsorption energy of 66.0 kJ . mol -1 calculated for a firstorder kinetics with a preexponential factor of 10 13 s -1. RAIRS suggests that the multilayer and monolayer may be composed of different HOCH 2CH 2NH 2 rotational isomers. HOCH 2CH 2NH 2 can also decompose on Cu(100), approximately at the same temperature range of monolayer desorption, mainly to evolve H 2 and H 2O at ̃400 K. An Ar +-sputtered Cu(100) surface is found to promote the dissociation of HOCH 2CH 2NH 2. Temperature-dependent RAIRS, with the assistance of theoretical calculations based on density-functional theory, strongly suggests that HOCH 2CH 2NH 2 on Cu(100) dissociates first by losing a hydrogen atom to form -OCH 2CH 2NH 2, followed by transformation into HOCH 2CH 2N=. Decomposition of the latter species is responsible for the desorption of H 2 and H 2O.

Original languageEnglish
Pages (from-to)4147-4154
Number of pages8
JournalJournal of Physical Chemistry C
Volume113
Issue number10
DOIs
Publication statusPublished - 2009 Mar 12

Fingerprint

monoethanolamine (MEA)
Ethanolamine
Desorption
desorption
Decomposition
decomposition
Adsorption
Monolayers
adsorption
Multilayers
Absorption spectroscopy
Isomers
Temperature
Density functional theory
temperature
Hydrogen
Infrared spectroscopy
hydrogen atoms
absorption spectroscopy
isomers

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

Cite this

Yi-Shiue, Lin ; Jain-Shiun, Lin ; Ching-Yung, Wang ; Che-Wei, Kuo ; Lin, Jong-Liang. / Adsorption and decomposition of monoethanolamine on Cu(100). In: Journal of Physical Chemistry C. 2009 ; Vol. 113, No. 10. pp. 4147-4154.
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abstract = "Temperature-programmed reaction/desorption and reflection-absorption infrared spectroscopy have been employed to investigate the adsorption and decomposition of HOCH 2CH 2NH 2 on Cu(100). HOCH 2CH 2NH 2 molecules desorb from the multilayer and monolayer with a maximum rate at 203 and 255 K, respectively. The desorption state at 255 K corresponds to an adsorption energy of 66.0 kJ . mol -1 calculated for a firstorder kinetics with a preexponential factor of 10 13 s -1. RAIRS suggests that the multilayer and monolayer may be composed of different HOCH 2CH 2NH 2 rotational isomers. HOCH 2CH 2NH 2 can also decompose on Cu(100), approximately at the same temperature range of monolayer desorption, mainly to evolve H 2 and H 2O at ̃400 K. An Ar +-sputtered Cu(100) surface is found to promote the dissociation of HOCH 2CH 2NH 2. Temperature-dependent RAIRS, with the assistance of theoretical calculations based on density-functional theory, strongly suggests that HOCH 2CH 2NH 2 on Cu(100) dissociates first by losing a hydrogen atom to form -OCH 2CH 2NH 2, followed by transformation into HOCH 2CH 2N=. Decomposition of the latter species is responsible for the desorption of H 2 and H 2O.",
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Yi-Shiue, L, Jain-Shiun, L, Ching-Yung, W, Che-Wei, K & Lin, J-L 2009, 'Adsorption and decomposition of monoethanolamine on Cu(100)', Journal of Physical Chemistry C, vol. 113, no. 10, pp. 4147-4154. https://doi.org/10.1021/jp8095117

Adsorption and decomposition of monoethanolamine on Cu(100). / Yi-Shiue, Lin; Jain-Shiun, Lin; Ching-Yung, Wang; Che-Wei, Kuo; Lin, Jong-Liang.

In: Journal of Physical Chemistry C, Vol. 113, No. 10, 12.03.2009, p. 4147-4154.

Research output: Contribution to journalArticle

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AB - Temperature-programmed reaction/desorption and reflection-absorption infrared spectroscopy have been employed to investigate the adsorption and decomposition of HOCH 2CH 2NH 2 on Cu(100). HOCH 2CH 2NH 2 molecules desorb from the multilayer and monolayer with a maximum rate at 203 and 255 K, respectively. The desorption state at 255 K corresponds to an adsorption energy of 66.0 kJ . mol -1 calculated for a firstorder kinetics with a preexponential factor of 10 13 s -1. RAIRS suggests that the multilayer and monolayer may be composed of different HOCH 2CH 2NH 2 rotational isomers. HOCH 2CH 2NH 2 can also decompose on Cu(100), approximately at the same temperature range of monolayer desorption, mainly to evolve H 2 and H 2O at ̃400 K. An Ar +-sputtered Cu(100) surface is found to promote the dissociation of HOCH 2CH 2NH 2. Temperature-dependent RAIRS, with the assistance of theoretical calculations based on density-functional theory, strongly suggests that HOCH 2CH 2NH 2 on Cu(100) dissociates first by losing a hydrogen atom to form -OCH 2CH 2NH 2, followed by transformation into HOCH 2CH 2N=. Decomposition of the latter species is responsible for the desorption of H 2 and H 2O.

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