Adsorption and diffusion sites of a Si atom on a reconstructed Si(100)-(2 × 1) surface

Zhen yu Zhang, Yan ten Lu, Horia Metiu

Research output: Contribution to journalArticlepeer-review

54 Citations (Scopus)

Abstract

We use Monte Carlo and molecular dynamics simulations to determine the adsorption sites, the barriers preventing site to site migration, and the dynamics of adsorption for a Si atom on a Si(100)-(2 × 1) surface. We find that the barriers to diffusion are highly anisotropic and strongly favor migration along the dimer rows. The site population at early times is controlled by the shape of the potential energy surface and it differs from the equilibrium population which is controlled by the binding energy.

Original languageEnglish
Pages (from-to)L250-L254
JournalSurface Science
Volume248
Issue number1-2
DOIs
Publication statusPublished - 1991 May 3

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Adsorption and diffusion sites of a Si atom on a reconstructed Si(100)-(2 × 1) surface'. Together they form a unique fingerprint.

Cite this