ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX

Fan-Tien Cheng (Inventor)

Research output: Patent

Abstract

An advanced process control (APC) system, an APC method, and a computer program product, which, when executed, performs an APC method are provided for incorporating virtual metrology (VM) into APC. The present inventions uses a reliance index (RI) and a global similarity index (GSI) to adjust at least one controller gain of a run-to-run (R2R) controller when the VM value of a workpiece is adopted to replace the actual measurement value of the workpiece. The RI is used for gauging the reliability of the VM value,
Translated title of the contribution應用具信心指標之虛擬量測的先進製程控制機制
Original languageEnglish
Patent number8688256
Publication statusPublished - 2012 Feb 2

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