ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX

Fan-Tien Cheng (Inventor)

Research output: Patent

Abstract

PROBLEM TO BE SOLVED: To provide a method capable of effectively considering data quality of VM in an R2R model, of overcoming a problem of being impossible to consider a degree of reliance in a VM feedback loop for R2R control and delayed metrology, and of improving APC efficacy. SOLUTION: An APC system comprises a process tool 100, a metrology tool 110, a virtual metrology (VM) module 120, a reliance index (RI) module 122, and an R2R controller 130. The APC system acquires multiple sets of history process data for processing multiple history workpieces, to be used for the process tool, and uses the metrology tool to acquire multiple history metrology data of history workpieces. The system uses the sets of history process data and history metrology values to build an estimation model based on an estimation algorithm,
Original languageEnglish
Patent number特許5292602
Publication statusPublished - 2012 Feb 16

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Process control
Control systems
Feedback
Controllers
Processing

Cite this

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N2 - PROBLEM TO BE SOLVED: To provide a method capable of effectively considering data quality of VM in an R2R model, of overcoming a problem of being impossible to consider a degree of reliance in a VM feedback loop for R2R control and delayed metrology, and of improving APC efficacy. SOLUTION: An APC system comprises a process tool 100, a metrology tool 110, a virtual metrology (VM) module 120, a reliance index (RI) module 122, and an R2R controller 130. The APC system acquires multiple sets of history process data for processing multiple history workpieces, to be used for the process tool, and uses the metrology tool to acquire multiple history metrology data of history workpieces. The system uses the sets of history process data and history metrology values to build an estimation model based on an estimation algorithm,

AB - PROBLEM TO BE SOLVED: To provide a method capable of effectively considering data quality of VM in an R2R model, of overcoming a problem of being impossible to consider a degree of reliance in a VM feedback loop for R2R control and delayed metrology, and of improving APC efficacy. SOLUTION: An APC system comprises a process tool 100, a metrology tool 110, a virtual metrology (VM) module 120, a reliance index (RI) module 122, and an R2R controller 130. The APC system acquires multiple sets of history process data for processing multiple history workpieces, to be used for the process tool, and uses the metrology tool to acquire multiple history metrology data of history workpieces. The system uses the sets of history process data and history metrology values to build an estimation model based on an estimation algorithm,

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