Abstract
| Original language | English |
|---|---|
| Patent number | 10-1335896 |
| Publication status | Published - 2012 Feb 10 |
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ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX. / Cheng, Fan-Tien (Inventor).
Patent No.: 10-1335896.Research output: Patent
TY - PAT
T1 - ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX
AU - Cheng, Fan-Tien
PY - 2012/2/10
Y1 - 2012/2/10
N2 - Advanced process control (APC) of merging the best measurement (VM) in the APC system, APC method, and computer program product for performing the method is provided when running APC. The present invention runs the VM value of the work-piece is to be adopted as a replacement for the actual measured value of the workpiece-to-run (R2R) at least dependent index (RI) and a global similarity index to adjust a control gain of the controller ( It uses GSI). RI use is used to measure the reliability of the VM value, GSI is to evaluate the similarity degree between all sets of process data of the history of process data to which the sets and used to make the speculative model for generating the virtual VM value do.
AB - Advanced process control (APC) of merging the best measurement (VM) in the APC system, APC method, and computer program product for performing the method is provided when running APC. The present invention runs the VM value of the work-piece is to be adopted as a replacement for the actual measured value of the workpiece-to-run (R2R) at least dependent index (RI) and a global similarity index to adjust a control gain of the controller ( It uses GSI). RI use is used to measure the reliability of the VM value, GSI is to evaluate the similarity degree between all sets of process data of the history of process data to which the sets and used to make the speculative model for generating the virtual VM value do.
M3 - Patent
M1 - 10-1335896
ER -