Abstract
Nanoimprinting technology was first developed in 1995 and is now recognized as one of the most promising approaches for large-area and low-cost fabrication of nanostructures. In this chapter, three types of laser-assisted and roller-based nanoimprinting and contact-printing methods developed in recent years will be addressed. First of all, a laser-assisted roller imprinting (LARI) method which can directly transfer the pattern from a quartz mold to a silicon substrate is introduced. The advantage of LARI is that the pattern transformation is direct, fast, and without any chemical etching processes. Secondly, a light-assisted metal film patterning (LAMP) method which transfers a patterned metal film directly from a silicon mold to a substrate is discussed. The pattern transformation relies on both mechanical contact pressure and optical heating at the interface. Metal patterns with 100 nm feature size can be easily transferred in laboratory using simple equipments and setups. Finally, a contact-transfer and mask-embedded lithography (CMEL) is proposed which cleverly arranges pure mechanical forces and surface energy difference to achieve the patterning of nanostructures on various kinds of substrates. Future developments and potential applications of these roller-based nanoimprinting and nano-patterning methods will be addressed.
| Original language | English |
|---|---|
| Title of host publication | Microsystems and Nanotechnology |
| Publisher | Springer-Verlag Berlin Heidelberg |
| Pages | 449-493 |
| Number of pages | 45 |
| Volume | 9783642182938 |
| ISBN (Electronic) | 9783642182938 |
| ISBN (Print) | 3642182925, 9783642182921 |
| DOIs | |
| Publication status | Published - 2012 Aug 1 |
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All Science Journal Classification (ASJC) codes
- Engineering(all)
- Biochemistry, Genetics and Molecular Biology(all)
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Advancement of laser-assisted and roller-based nanoimprinting technology. / Lee, Yung-Chun; Hsiao, Fei Bin.
Microsystems and Nanotechnology. Vol. 9783642182938 Springer-Verlag Berlin Heidelberg, 2012. p. 449-493.Research output: Chapter in Book/Report/Conference proceeding › Chapter
TY - CHAP
T1 - Advancement of laser-assisted and roller-based nanoimprinting technology
AU - Lee, Yung-Chun
AU - Hsiao, Fei Bin
PY - 2012/8/1
Y1 - 2012/8/1
N2 - Nanoimprinting technology was first developed in 1995 and is now recognized as one of the most promising approaches for large-area and low-cost fabrication of nanostructures. In this chapter, three types of laser-assisted and roller-based nanoimprinting and contact-printing methods developed in recent years will be addressed. First of all, a laser-assisted roller imprinting (LARI) method which can directly transfer the pattern from a quartz mold to a silicon substrate is introduced. The advantage of LARI is that the pattern transformation is direct, fast, and without any chemical etching processes. Secondly, a light-assisted metal film patterning (LAMP) method which transfers a patterned metal film directly from a silicon mold to a substrate is discussed. The pattern transformation relies on both mechanical contact pressure and optical heating at the interface. Metal patterns with 100 nm feature size can be easily transferred in laboratory using simple equipments and setups. Finally, a contact-transfer and mask-embedded lithography (CMEL) is proposed which cleverly arranges pure mechanical forces and surface energy difference to achieve the patterning of nanostructures on various kinds of substrates. Future developments and potential applications of these roller-based nanoimprinting and nano-patterning methods will be addressed.
AB - Nanoimprinting technology was first developed in 1995 and is now recognized as one of the most promising approaches for large-area and low-cost fabrication of nanostructures. In this chapter, three types of laser-assisted and roller-based nanoimprinting and contact-printing methods developed in recent years will be addressed. First of all, a laser-assisted roller imprinting (LARI) method which can directly transfer the pattern from a quartz mold to a silicon substrate is introduced. The advantage of LARI is that the pattern transformation is direct, fast, and without any chemical etching processes. Secondly, a light-assisted metal film patterning (LAMP) method which transfers a patterned metal film directly from a silicon mold to a substrate is discussed. The pattern transformation relies on both mechanical contact pressure and optical heating at the interface. Metal patterns with 100 nm feature size can be easily transferred in laboratory using simple equipments and setups. Finally, a contact-transfer and mask-embedded lithography (CMEL) is proposed which cleverly arranges pure mechanical forces and surface energy difference to achieve the patterning of nanostructures on various kinds of substrates. Future developments and potential applications of these roller-based nanoimprinting and nano-patterning methods will be addressed.
UR - http://www.scopus.com/inward/record.url?scp=84929860037&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84929860037&partnerID=8YFLogxK
U2 - 10.1007/978-3-642-18293-8_12
DO - 10.1007/978-3-642-18293-8_12
M3 - Chapter
AN - SCOPUS:84929860037
SN - 3642182925
SN - 9783642182921
VL - 9783642182938
SP - 449
EP - 493
BT - Microsystems and Nanotechnology
PB - Springer-Verlag Berlin Heidelberg
ER -