Advancement of laser-assisted and roller-based nanoimprinting technology

Yung-Chun Lee, Fei Bin Hsiao

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

Nanoimprinting technology was first developed in 1995 and is now recognized as one of the most promising approaches for large-area and low-cost fabrication of nanostructures. In this chapter, three types of laser-assisted and roller-based nanoimprinting and contact-printing methods developed in recent years will be addressed. First of all, a laser-assisted roller imprinting (LARI) method which can directly transfer the pattern from a quartz mold to a silicon substrate is introduced. The advantage of LARI is that the pattern transformation is direct, fast, and without any chemical etching processes. Secondly, a light-assisted metal film patterning (LAMP) method which transfers a patterned metal film directly from a silicon mold to a substrate is discussed. The pattern transformation relies on both mechanical contact pressure and optical heating at the interface. Metal patterns with 100 nm feature size can be easily transferred in laboratory using simple equipments and setups. Finally, a contact-transfer and mask-embedded lithography (CMEL) is proposed which cleverly arranges pure mechanical forces and surface energy difference to achieve the patterning of nanostructures on various kinds of substrates. Future developments and potential applications of these roller-based nanoimprinting and nano-patterning methods will be addressed.

Original languageEnglish
Title of host publicationMicrosystems and Nanotechnology
PublisherSpringer-Verlag Berlin Heidelberg
Pages449-493
Number of pages45
Volume9783642182938
ISBN (Electronic)9783642182938
ISBN (Print)3642182925, 9783642182921
DOIs
Publication statusPublished - 2012 Aug 1

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Lasers
Silicon
Technology
Nanostructures
Light Metals
Substrates
Metals
Quartz
Fungi
Chemical Phenomena
Interfacial energy
Lithography
Printing
Masks
Etching
Heating
Fabrication
Pressure
Costs and Cost Analysis
Equipment and Supplies

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Biochemistry, Genetics and Molecular Biology(all)

Cite this

Lee, Y-C., & Hsiao, F. B. (2012). Advancement of laser-assisted and roller-based nanoimprinting technology. In Microsystems and Nanotechnology (Vol. 9783642182938, pp. 449-493). Springer-Verlag Berlin Heidelberg. https://doi.org/10.1007/978-3-642-18293-8_12
Lee, Yung-Chun ; Hsiao, Fei Bin. / Advancement of laser-assisted and roller-based nanoimprinting technology. Microsystems and Nanotechnology. Vol. 9783642182938 Springer-Verlag Berlin Heidelberg, 2012. pp. 449-493
@inbook{bb842e46723a4b9a9187c06514bcb32a,
title = "Advancement of laser-assisted and roller-based nanoimprinting technology",
abstract = "Nanoimprinting technology was first developed in 1995 and is now recognized as one of the most promising approaches for large-area and low-cost fabrication of nanostructures. In this chapter, three types of laser-assisted and roller-based nanoimprinting and contact-printing methods developed in recent years will be addressed. First of all, a laser-assisted roller imprinting (LARI) method which can directly transfer the pattern from a quartz mold to a silicon substrate is introduced. The advantage of LARI is that the pattern transformation is direct, fast, and without any chemical etching processes. Secondly, a light-assisted metal film patterning (LAMP) method which transfers a patterned metal film directly from a silicon mold to a substrate is discussed. The pattern transformation relies on both mechanical contact pressure and optical heating at the interface. Metal patterns with 100 nm feature size can be easily transferred in laboratory using simple equipments and setups. Finally, a contact-transfer and mask-embedded lithography (CMEL) is proposed which cleverly arranges pure mechanical forces and surface energy difference to achieve the patterning of nanostructures on various kinds of substrates. Future developments and potential applications of these roller-based nanoimprinting and nano-patterning methods will be addressed.",
author = "Yung-Chun Lee and Hsiao, {Fei Bin}",
year = "2012",
month = "8",
day = "1",
doi = "10.1007/978-3-642-18293-8_12",
language = "English",
isbn = "3642182925",
volume = "9783642182938",
pages = "449--493",
booktitle = "Microsystems and Nanotechnology",
publisher = "Springer-Verlag Berlin Heidelberg",

}

Lee, Y-C & Hsiao, FB 2012, Advancement of laser-assisted and roller-based nanoimprinting technology. in Microsystems and Nanotechnology. vol. 9783642182938, Springer-Verlag Berlin Heidelberg, pp. 449-493. https://doi.org/10.1007/978-3-642-18293-8_12

Advancement of laser-assisted and roller-based nanoimprinting technology. / Lee, Yung-Chun; Hsiao, Fei Bin.

Microsystems and Nanotechnology. Vol. 9783642182938 Springer-Verlag Berlin Heidelberg, 2012. p. 449-493.

Research output: Chapter in Book/Report/Conference proceedingChapter

TY - CHAP

T1 - Advancement of laser-assisted and roller-based nanoimprinting technology

AU - Lee, Yung-Chun

AU - Hsiao, Fei Bin

PY - 2012/8/1

Y1 - 2012/8/1

N2 - Nanoimprinting technology was first developed in 1995 and is now recognized as one of the most promising approaches for large-area and low-cost fabrication of nanostructures. In this chapter, three types of laser-assisted and roller-based nanoimprinting and contact-printing methods developed in recent years will be addressed. First of all, a laser-assisted roller imprinting (LARI) method which can directly transfer the pattern from a quartz mold to a silicon substrate is introduced. The advantage of LARI is that the pattern transformation is direct, fast, and without any chemical etching processes. Secondly, a light-assisted metal film patterning (LAMP) method which transfers a patterned metal film directly from a silicon mold to a substrate is discussed. The pattern transformation relies on both mechanical contact pressure and optical heating at the interface. Metal patterns with 100 nm feature size can be easily transferred in laboratory using simple equipments and setups. Finally, a contact-transfer and mask-embedded lithography (CMEL) is proposed which cleverly arranges pure mechanical forces and surface energy difference to achieve the patterning of nanostructures on various kinds of substrates. Future developments and potential applications of these roller-based nanoimprinting and nano-patterning methods will be addressed.

AB - Nanoimprinting technology was first developed in 1995 and is now recognized as one of the most promising approaches for large-area and low-cost fabrication of nanostructures. In this chapter, three types of laser-assisted and roller-based nanoimprinting and contact-printing methods developed in recent years will be addressed. First of all, a laser-assisted roller imprinting (LARI) method which can directly transfer the pattern from a quartz mold to a silicon substrate is introduced. The advantage of LARI is that the pattern transformation is direct, fast, and without any chemical etching processes. Secondly, a light-assisted metal film patterning (LAMP) method which transfers a patterned metal film directly from a silicon mold to a substrate is discussed. The pattern transformation relies on both mechanical contact pressure and optical heating at the interface. Metal patterns with 100 nm feature size can be easily transferred in laboratory using simple equipments and setups. Finally, a contact-transfer and mask-embedded lithography (CMEL) is proposed which cleverly arranges pure mechanical forces and surface energy difference to achieve the patterning of nanostructures on various kinds of substrates. Future developments and potential applications of these roller-based nanoimprinting and nano-patterning methods will be addressed.

UR - http://www.scopus.com/inward/record.url?scp=84929860037&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84929860037&partnerID=8YFLogxK

U2 - 10.1007/978-3-642-18293-8_12

DO - 10.1007/978-3-642-18293-8_12

M3 - Chapter

AN - SCOPUS:84929860037

SN - 3642182925

SN - 9783642182921

VL - 9783642182938

SP - 449

EP - 493

BT - Microsystems and Nanotechnology

PB - Springer-Verlag Berlin Heidelberg

ER -

Lee Y-C, Hsiao FB. Advancement of laser-assisted and roller-based nanoimprinting technology. In Microsystems and Nanotechnology. Vol. 9783642182938. Springer-Verlag Berlin Heidelberg. 2012. p. 449-493 https://doi.org/10.1007/978-3-642-18293-8_12