Amorphous InGaZnO Ultraviolet Phototransistors with a Thin Ga2O3 Layer

Shoou Jinn Chang, T. H. Chang, W. Y. Weng, C. J. Chiu, S. P. Chang

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

The authors report the fabrication of amorphous IGZO (a-IGZO) phototransistors with a thin Ga2O3 layer. It was found that the performances of the phototransistors depend strongly on the oxygen partial pressure during the deposition of the Ga2O3 layer. It was also found that the fabricated devices exhibited good electrical properties with electron mobility (μFE) of 13.2 cm2/V·s, subthreshold swing (SS) of 0.13 V/decade, and ON/OFF current ratio > 5 × 105. Furthermore, it was found that two cutoffs exist in the devices prepared with 25% oxygen partial pressure. The deep-ultraviolet (UV)-to-visible rejection ratio and near-UV-to-visible rejection ratio of the fabricated phototransistors were 104 and 20, respectively.

Original languageEnglish
Article number6832459
Pages (from-to)125-129
Number of pages5
JournalIEEE Journal of Selected Topics in Quantum Electronics
Volume20
Issue number6
DOIs
Publication statusPublished - 2014 Nov 1

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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