Amorphous W₄₀Re₄₀B₂₀ diffusion barriers for <Si>/Al and <Si>/Cu metallizations

Engineering & Materials Science

• Diffusion barriers 100%
• Metallizing 78%
• Amorphous films 73%
• Crystallization 49%
• Metallic films 37%
• Aluminum 34%
• Monocrystalline silicon 34%
• Backscattering 30%
• Spectrometry 29%
• Sputtering 28%
• Temperature 27%
• Chemical reactions 22%
• X ray diffraction 22%
• Thin films 21%
• Diodes 20%
• X rays 20%
• Vacuum 19%
• Copper 18%
• Scanning electron microscopy 17%
• Substrates 15%
• Cracks 15%

Chemical Compounds

• Diffusion Barrier 85%
• Crystallization Point 72%
• Backscattering 48%
• Amorphous Material 46%
• Liquid Film 32%
• Alloy 23%
• X-Ray 20%
• Scanning Electron Microscopy 20%
• X-Ray Diffraction 16%

Physics & Astronomy

• crystallization 34%
• aluminum 30%
• junction diodes 29%
• x ray spectroscopy 22%
• electrical measurement 21%
• chemical reactions 20%
• backscattering 20%
• temperature 20%
• sputtering 17%
• cracks 17%
• copper 16%
• scanning electron microscopy 14%
• electrical resistivity 14%
• vacuum 14%
• silicon 12%
• diffraction 12%
• thin films 11%
• x rays 10%
• performance 9%
• energy 6%