An application of Mueller matrix polarimetry for characterising properties of thin film with surface roughness

Quoc Hung Phan, Yu Lung Lo

Research output: Contribution to journalConference article

Abstract

A new Mueller ellipsometry method was proposed for characterising the optical properties of thin films with rough surfaces. The validity of the proposed study is demonstrated by comparing the experimental results of the refractive index and thickness of thin film with the analytical results. Furthermore, the proposed study extracted successfully the surface roughness of thin film samples in a non contact optical manner. It provides a potential solution to replace the well-known effective approximate medium (EMA) method in dealing with the fine coarse rough surface thin film.

Original languageEnglish
Article number05006
JournalMATEC Web of Conferences
Volume32
DOIs
Publication statusPublished - 2015 Dec 2
EventInternational Symposium of Optomechatronics Technology, ISOT 2015 - Neuchatel, Switzerland
Duration: 2015 Oct 142015 Oct 16

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Polarimeters
Surface roughness
Thin films
Ellipsometry
Refractive index
Optical properties

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Engineering(all)

Cite this

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An application of Mueller matrix polarimetry for characterising properties of thin film with surface roughness. / Phan, Quoc Hung; Lo, Yu Lung.

In: MATEC Web of Conferences, Vol. 32, 05006, 02.12.2015.

Research output: Contribution to journalConference article

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