An extra photoresist film fabricated in liquid crystal lens array to prevent occurrence of disclination lines

Chia Shan He, Ping Hung Tang, Wei Yi Lu, Ya-Ting, Chun Hung Lin, Chia Rong Sheu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A proposed method used to prevent the disclination line occurrence in liquid crystal lens array, which is usage of an extra non-patterned or patterned SU8 photoresist films coated on surfaces of patterned ITO films in lens structures. As a result, the problem of disclination line occurrence is effectively prevented.

Original languageEnglish
Title of host publication21st International Display Workshops 2014, IDW 2014
PublisherSociety for Information Display
Pages121-122
Number of pages2
ISBN (Electronic)9781510827790
Publication statusPublished - 2014
Event21st International Display Workshops 2014, IDW 2014 - Niigata, Japan
Duration: 2014 Dec 32014 Dec 5

Publication series

Name21st International Display Workshops 2014, IDW 2014
Volume1

Other

Other21st International Display Workshops 2014, IDW 2014
Country/TerritoryJapan
CityNiigata
Period14-12-0314-12-05

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Human-Computer Interaction
  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'An extra photoresist film fabricated in liquid crystal lens array to prevent occurrence of disclination lines'. Together they form a unique fingerprint.

Cite this