An improved simulated annealing for facility layout problems in cellular manufacturing systems

Tai Yue Wang, Her Chang Lin, Kuei Bin Wu

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

In this paper, we formulate a model solving both inter-cell and intra-cell facility layout problems for cellular manufacturing systems. This model minimizes the total material handling distance on the shop floor. Due to the complexity of the problem, we propose an improved simulated annealing algorithm to solve this problem. This algorithm modifies the generation mechanism of neighborhood configurations. This new generation mechanism can always generate a neighborhood configuration that satisfies all of the zoning constraints. Then, the comparison between the improved simulated annealing algorithm and Kouvelis's is conducted. The results show that the improved simulated annealing algorithm produces the same solution quality while requiring less computation time as the problem size is increased.

Original languageEnglish
Pages (from-to)309-319
Number of pages11
JournalComputers and Industrial Engineering
Volume34
Issue number2-4
Publication statusPublished - 1998 Apr 1

Fingerprint

Cellular Manufacturing Systems
Facility Layout
Cellular manufacturing
Simulated annealing
Simulated Annealing
Simulated Annealing Algorithm
Zoning
Materials Handling
Configuration
Cell
Materials handling
Minimise
Simulated annealing algorithm
Cellular manufacturing systems
Facility layout
Model

All Science Journal Classification (ASJC) codes

  • Computer Science(all)
  • Engineering(all)

Cite this

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An improved simulated annealing for facility layout problems in cellular manufacturing systems. / Wang, Tai Yue; Lin, Her Chang; Wu, Kuei Bin.

In: Computers and Industrial Engineering, Vol. 34, No. 2-4, 01.04.1998, p. 309-319.

Research output: Contribution to journalArticle

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