An improved two-load method for whole-field complete photoelastic fringe analysis

T. Y. Chen, H. L. Lee, Y. C. Chou

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

An improved two-load method for whole-field complete determination of photoelastic parameters is presented. The dark-field isoclinic images are used to determine the isoclinic angles. Using two isoclinic maps obtained from two different loads effectively compensates the indeterminable points. The use of dark-field and light-field photoelastic images for normalization extends the two-load method to analyze dark-field photoelastic fringe patterns and avoids model movement. Larger errors on the determined fringe orders are further reduced by a least-squares quadric fitting. The results are compared well to the theoretical ones. Further comparison of the improved two-load method and the two-wavelength method are given.

Original languageEnglish
Pages (from-to)199-203
Number of pages5
JournalJournal of Mechanics
Volume21
Issue number3
DOIs
Publication statusPublished - 2005 Sep

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Mechanical Engineering
  • Applied Mathematics

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