Analysis of the isothermal compression in nanoimprint lithography assuming a power-law fluid

I. C. Hsin, W. B. Young

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

One of the choices for defining a nano pattern in micro fabrication is to use the nanoimprint lithography. This method is also known as a hot embossing lithography due to its inherited process technique from the compression process. It is important to determine the appropriate conditions of pressure, temperature, and time in the nanoimprint lithography process. To determine the right conditions for nanoimprint lithography, one has to understand the polymer flow behavior during the imprinting process. In this study, a simplified analytical model was developed based on a power-law fluid to predict the polymer flow during the imprinting process. Under a constant imprint force, the imprint depth on a polymer film can be predicted using this model. Experimental tests were also conducted to verify the results. It was demonstrated that the model can provide reasonable results on the imprint depth.

Original languageEnglish
Pages (from-to)24-29
Number of pages6
JournalInternational Polymer Processing
Volume23
Issue number1
DOIs
Publication statusPublished - 2008 Mar

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)
  • Polymers and Plastics
  • Industrial and Manufacturing Engineering
  • Materials Chemistry

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