TY - JOUR
T1 - Annealing effects on properties of antimony tin oxide thin films deposited by RF reactive magnetron sputtering
AU - Huang, Jow Lay
AU - Pan, Yi
AU - Chang, Jia Yuan
AU - Yau, Bao Shun
N1 - Funding Information:
The authors would like to thank the National Science Council of the ROC for its financial support under the contract no. NSC 91-2216-E006-057.
PY - 2004/6/22
Y1 - 2004/6/22
N2 - Antimony tin oxide (ATO) films were sputtered on glass substrates using RF reactive magnetron sputtering at a power of 100 W, a substrate temperature of 300 °C and an oxygen flow rate ranging from 7 to 20 sccm. The films were annealed for 1 h in oxygen and nitrogen atmospheres at temperatures of 300, 400 and 500 °C. Annealing effect was studied by comparing the electrical and optical properties of the annealed and unannealed films.
AB - Antimony tin oxide (ATO) films were sputtered on glass substrates using RF reactive magnetron sputtering at a power of 100 W, a substrate temperature of 300 °C and an oxygen flow rate ranging from 7 to 20 sccm. The films were annealed for 1 h in oxygen and nitrogen atmospheres at temperatures of 300, 400 and 500 °C. Annealing effect was studied by comparing the electrical and optical properties of the annealed and unannealed films.
UR - http://www.scopus.com/inward/record.url?scp=2642575784&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=2642575784&partnerID=8YFLogxK
U2 - 10.1016/j.surfcoat.2003.11.004
DO - 10.1016/j.surfcoat.2003.11.004
M3 - Article
AN - SCOPUS:2642575784
SN - 0257-8972
VL - 184
SP - 188
EP - 193
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
IS - 2-3
ER -