Annealing effects on properties of antimony tin oxide thin films deposited by RF reactive magnetron sputtering

Jow Lay Huang, Yi Pan, Jia Yuan Chang, Bao Shun Yau

Research output: Contribution to journalArticle

33 Citations (Scopus)

Abstract

Antimony tin oxide (ATO) films were sputtered on glass substrates using RF reactive magnetron sputtering at a power of 100 W, a substrate temperature of 300 °C and an oxygen flow rate ranging from 7 to 20 sccm. The films were annealed for 1 h in oxygen and nitrogen atmospheres at temperatures of 300, 400 and 500 °C. Annealing effect was studied by comparing the electrical and optical properties of the annealed and unannealed films.

Original languageEnglish
Pages (from-to)188-193
Number of pages6
JournalSurface and Coatings Technology
Volume184
Issue number2-3
DOIs
Publication statusPublished - 2004 Jun 22

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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